Working principle of carrier selective poly-Si/c-Si junctions: Is tunnelling the whole story?

Research output: Contribution to journalArticleResearchpeer review

Authors

  • R. Peibst
  • U. Römer
  • Y. Larionova
  • M. Rienäcker
  • A. Merkle
  • N. Folchert
  • S. Reiter
  • M. Turcu
  • B. Min
  • J. Krügener
  • D. Tetzlaff
  • E. Bugiel
  • T. Wietler
  • R. Brendel

External Research Organisations

  • Institute for Solar Energy Research (ISFH)
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Details

Original languageEnglish
Pages (from-to)60-67
Number of pages8
JournalSolar Energy Materials and Solar Cells
Volume158
Publication statusPublished - 1 Dec 2016

Abstract

We present arguments that additional effects besides laterally homogenous tunnelling might occur in carrier-selective poly-Si/c-Si junctions: (i) the symmetrical electrical behaviour of n+ and p+ poly-Si/c-Si junctions, (ii) direct observation of structural modifications of the interfacial oxide upon thermal treatment by transmission electron microscopy, even for poly-Si/c-Si junctions with good passivation quality, and (iii) the achievement of low junction resistances even for interfacial oxide thicknesses >2 nm after thermal treatment. We present an alternative picture, essentially based on a localized current flow through the interfacial oxide, mediated either by local reduction of the oxide layer thickness or by pinholes. In consequence, the local current flow implies transport limitations for both minority and majority carriers in the c-Si absorber, and thus a correlation between recombination current and series resistance. Thus, a poly-Si/c-Si junction can also be explained within the framework of a classical pn junction picture for a passivated, locally contacted emitter, e.g. by the model of Fischer. Both electron selective contacts (n+ poly-Si) and hole selective contacts (p+ poly-Si) can be described consistently when using reasonable input parameters. Especially for p+ poly-Si/c-Si junctions, our model could guideline further improvement.

Keywords

    Modelling, Passivating contact, Passivation, Polysilicon, Silicon solar cell

ASJC Scopus subject areas

Sustainable Development Goals

Cite this

Working principle of carrier selective poly-Si/c-Si junctions: Is tunnelling the whole story? / Peibst, R.; Römer, U.; Larionova, Y. et al.
In: Solar Energy Materials and Solar Cells, Vol. 158, 01.12.2016, p. 60-67.

Research output: Contribution to journalArticleResearchpeer review

Peibst, R, Römer, U, Larionova, Y, Rienäcker, M, Merkle, A, Folchert, N, Reiter, S, Turcu, M, Min, B, Krügener, J, Tetzlaff, D, Bugiel, E, Wietler, T & Brendel, R 2016, 'Working principle of carrier selective poly-Si/c-Si junctions: Is tunnelling the whole story?', Solar Energy Materials and Solar Cells, vol. 158, pp. 60-67. https://doi.org/10.1016/j.solmat.2016.05.045
Peibst, R., Römer, U., Larionova, Y., Rienäcker, M., Merkle, A., Folchert, N., Reiter, S., Turcu, M., Min, B., Krügener, J., Tetzlaff, D., Bugiel, E., Wietler, T., & Brendel, R. (2016). Working principle of carrier selective poly-Si/c-Si junctions: Is tunnelling the whole story? Solar Energy Materials and Solar Cells, 158, 60-67. https://doi.org/10.1016/j.solmat.2016.05.045
Peibst R, Römer U, Larionova Y, Rienäcker M, Merkle A, Folchert N et al. Working principle of carrier selective poly-Si/c-Si junctions: Is tunnelling the whole story? Solar Energy Materials and Solar Cells. 2016 Dec 1;158:60-67. doi: 10.1016/j.solmat.2016.05.045
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title = "Working principle of carrier selective poly-Si/c-Si junctions: Is tunnelling the whole story?",
abstract = "We present arguments that additional effects besides laterally homogenous tunnelling might occur in carrier-selective poly-Si/c-Si junctions: (i) the symmetrical electrical behaviour of n+ and p+ poly-Si/c-Si junctions, (ii) direct observation of structural modifications of the interfacial oxide upon thermal treatment by transmission electron microscopy, even for poly-Si/c-Si junctions with good passivation quality, and (iii) the achievement of low junction resistances even for interfacial oxide thicknesses >2 nm after thermal treatment. We present an alternative picture, essentially based on a localized current flow through the interfacial oxide, mediated either by local reduction of the oxide layer thickness or by pinholes. In consequence, the local current flow implies transport limitations for both minority and majority carriers in the c-Si absorber, and thus a correlation between recombination current and series resistance. Thus, a poly-Si/c-Si junction can also be explained within the framework of a classical pn junction picture for a passivated, locally contacted emitter, e.g. by the model of Fischer. Both electron selective contacts (n+ poly-Si) and hole selective contacts (p+ poly-Si) can be described consistently when using reasonable input parameters. Especially for p+ poly-Si/c-Si junctions, our model could guideline further improvement.",
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note = "Funding information: This work is mainly performed in the framework of the HERCULES project. HERCULES receives funding from the European Union's Seventh Program for research, technological development and demonstration under grant Agreement no. 608498 . Other parts of the work are funded by the German Ministry for Economic Affairs and Energy under Grants 0325702 (POLO) and 0325478 (SIMPLIHIGH).",
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TY - JOUR

T1 - Working principle of carrier selective poly-Si/c-Si junctions

T2 - Is tunnelling the whole story?

AU - Peibst, R.

AU - Römer, U.

AU - Larionova, Y.

AU - Rienäcker, M.

AU - Merkle, A.

AU - Folchert, N.

AU - Reiter, S.

AU - Turcu, M.

AU - Min, B.

AU - Krügener, J.

AU - Tetzlaff, D.

AU - Bugiel, E.

AU - Wietler, T.

AU - Brendel, R.

N1 - Funding information: This work is mainly performed in the framework of the HERCULES project. HERCULES receives funding from the European Union's Seventh Program for research, technological development and demonstration under grant Agreement no. 608498 . Other parts of the work are funded by the German Ministry for Economic Affairs and Energy under Grants 0325702 (POLO) and 0325478 (SIMPLIHIGH).

PY - 2016/12/1

Y1 - 2016/12/1

N2 - We present arguments that additional effects besides laterally homogenous tunnelling might occur in carrier-selective poly-Si/c-Si junctions: (i) the symmetrical electrical behaviour of n+ and p+ poly-Si/c-Si junctions, (ii) direct observation of structural modifications of the interfacial oxide upon thermal treatment by transmission electron microscopy, even for poly-Si/c-Si junctions with good passivation quality, and (iii) the achievement of low junction resistances even for interfacial oxide thicknesses >2 nm after thermal treatment. We present an alternative picture, essentially based on a localized current flow through the interfacial oxide, mediated either by local reduction of the oxide layer thickness or by pinholes. In consequence, the local current flow implies transport limitations for both minority and majority carriers in the c-Si absorber, and thus a correlation between recombination current and series resistance. Thus, a poly-Si/c-Si junction can also be explained within the framework of a classical pn junction picture for a passivated, locally contacted emitter, e.g. by the model of Fischer. Both electron selective contacts (n+ poly-Si) and hole selective contacts (p+ poly-Si) can be described consistently when using reasonable input parameters. Especially for p+ poly-Si/c-Si junctions, our model could guideline further improvement.

AB - We present arguments that additional effects besides laterally homogenous tunnelling might occur in carrier-selective poly-Si/c-Si junctions: (i) the symmetrical electrical behaviour of n+ and p+ poly-Si/c-Si junctions, (ii) direct observation of structural modifications of the interfacial oxide upon thermal treatment by transmission electron microscopy, even for poly-Si/c-Si junctions with good passivation quality, and (iii) the achievement of low junction resistances even for interfacial oxide thicknesses >2 nm after thermal treatment. We present an alternative picture, essentially based on a localized current flow through the interfacial oxide, mediated either by local reduction of the oxide layer thickness or by pinholes. In consequence, the local current flow implies transport limitations for both minority and majority carriers in the c-Si absorber, and thus a correlation between recombination current and series resistance. Thus, a poly-Si/c-Si junction can also be explained within the framework of a classical pn junction picture for a passivated, locally contacted emitter, e.g. by the model of Fischer. Both electron selective contacts (n+ poly-Si) and hole selective contacts (p+ poly-Si) can be described consistently when using reasonable input parameters. Especially for p+ poly-Si/c-Si junctions, our model could guideline further improvement.

KW - Modelling

KW - Passivating contact

KW - Passivation

KW - Polysilicon

KW - Silicon solar cell

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U2 - 10.1016/j.solmat.2016.05.045

DO - 10.1016/j.solmat.2016.05.045

M3 - Article

AN - SCOPUS:84971667640

VL - 158

SP - 60

EP - 67

JO - Solar Energy Materials and Solar Cells

JF - Solar Energy Materials and Solar Cells

SN - 0927-0248

ER -

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