Unsteady 3D and analytical analysis of segregation process in floating zone silicon single crystal growth

Research output: Contribution to journalArticleResearchpeer review

Authors

  • K. Lacis
  • A. Muižnieks
  • N. Jekabsons
  • A. Rudevičs
  • B. Nacke

External Research Organisations

  • University of Latvia
  • Ventspils University College
View graph of relations

Details

Original languageEnglish
Pages (from-to)549-556
Number of pages8
JournalMagnetohydrodynamics
Volume45
Issue number4
Publication statusPublished - 2009
EventInternational Scientific Colloquium Modelling for Electromagnetic Processing - Hannover
Duration: 27 Oct 200829 Oct 2008
Conference number: 5

Abstract

3D unsteady numerical calculations of velocity, temperature and dopant concentration fields in the molten zone in Floating Zone (FZ) Si single crystal growth process using a HF magnetic field are carried out. The recorded fluctuations of physical fields near the crystallization interface are used to estimate the possible fluctuations of the crystal growth rate. Analytical estimation of the amplitude of concentration oscillations due to changing local crystal growth rate is carried out.

ASJC Scopus subject areas

Cite this

Unsteady 3D and analytical analysis of segregation process in floating zone silicon single crystal growth. / Lacis, K.; Muižnieks, A.; Jekabsons, N. et al.
In: Magnetohydrodynamics, Vol. 45, No. 4, 2009, p. 549-556.

Research output: Contribution to journalArticleResearchpeer review

Lacis K, Muižnieks A, Jekabsons N, Rudevičs A, Nacke B. Unsteady 3D and analytical analysis of segregation process in floating zone silicon single crystal growth. Magnetohydrodynamics. 2009;45(4):549-556. doi: 10.22364/mhd.45.4.9
Lacis, K. ; Muižnieks, A. ; Jekabsons, N. et al. / Unsteady 3D and analytical analysis of segregation process in floating zone silicon single crystal growth. In: Magnetohydrodynamics. 2009 ; Vol. 45, No. 4. pp. 549-556.
Download
@article{a10e5077925446da98030657f4a98ea1,
title = "Unsteady 3D and analytical analysis of segregation process in floating zone silicon single crystal growth",
abstract = "3D unsteady numerical calculations of velocity, temperature and dopant concentration fields in the molten zone in Floating Zone (FZ) Si single crystal growth process using a HF magnetic field are carried out. The recorded fluctuations of physical fields near the crystallization interface are used to estimate the possible fluctuations of the crystal growth rate. Analytical estimation of the amplitude of concentration oscillations due to changing local crystal growth rate is carried out.",
author = "K. Lacis and A. Mui{\v z}nieks and N. Jekabsons and A. Rudevi{\v c}s and B. Nacke",
year = "2009",
doi = "10.22364/mhd.45.4.9",
language = "English",
volume = "45",
pages = "549--556",
journal = "Magnetohydrodynamics",
issn = "0024-998X",
publisher = "Institute of Physics, University of Latvia",
number = "4",
note = "International Scientific Colloquium Modelling for Electromagnetic Processing ; Conference date: 27-10-2008 Through 29-10-2008",

}

Download

TY - JOUR

T1 - Unsteady 3D and analytical analysis of segregation process in floating zone silicon single crystal growth

AU - Lacis, K.

AU - Muižnieks, A.

AU - Jekabsons, N.

AU - Rudevičs, A.

AU - Nacke, B.

N1 - Conference code: 5

PY - 2009

Y1 - 2009

N2 - 3D unsteady numerical calculations of velocity, temperature and dopant concentration fields in the molten zone in Floating Zone (FZ) Si single crystal growth process using a HF magnetic field are carried out. The recorded fluctuations of physical fields near the crystallization interface are used to estimate the possible fluctuations of the crystal growth rate. Analytical estimation of the amplitude of concentration oscillations due to changing local crystal growth rate is carried out.

AB - 3D unsteady numerical calculations of velocity, temperature and dopant concentration fields in the molten zone in Floating Zone (FZ) Si single crystal growth process using a HF magnetic field are carried out. The recorded fluctuations of physical fields near the crystallization interface are used to estimate the possible fluctuations of the crystal growth rate. Analytical estimation of the amplitude of concentration oscillations due to changing local crystal growth rate is carried out.

UR - http://www.scopus.com/inward/record.url?scp=77950795518&partnerID=8YFLogxK

U2 - 10.22364/mhd.45.4.9

DO - 10.22364/mhd.45.4.9

M3 - Article

AN - SCOPUS:77950795518

VL - 45

SP - 549

EP - 556

JO - Magnetohydrodynamics

JF - Magnetohydrodynamics

SN - 0024-998X

IS - 4

T2 - International Scientific Colloquium Modelling for Electromagnetic Processing

Y2 - 27 October 2008 through 29 October 2008

ER -

By the same author(s)