Ultra low-loss low-efficiency diffraction gratings

Research output: Contribution to journalArticleResearchpeer review

Authors

  • T. Clausnitzer
  • E. B. Kley
  • A. Tünnermann
  • A. Bunkowski
  • O. Burmeister
  • K. Danzmann
  • R. Schnabel
  • S. Gliech
  • A. Duparré

External Research Organisations

  • Friedrich Schiller University Jena
  • Max Planck Institute for Gravitational Physics (Albert Einstein Institute)
  • Fraunhofer Institute for Applied Optics and Precision Engineering (IOF)
View graph of relations

Details

Original languageEnglish
Pages (from-to)4370-4378
Number of pages9
JournalOptics express
Volume13
Issue number12
Publication statusPublished - 13 Jun 2005

Abstract

The realization of ultra low-loss dielectric reflection gratings with diffraction efficiencies between 7% and 0.02% is presented. By placing the grating beneath the highly reflective layerstack scattering was significantly reduced. This concept allows the all-reflective coupling of high laser radiation to high finesse cavities, thereby circumventing thermal effects caused by absorption in the substrate.

ASJC Scopus subject areas

Cite this

Ultra low-loss low-efficiency diffraction gratings. / Clausnitzer, T.; Kley, E. B.; Tünnermann, A. et al.
In: Optics express, Vol. 13, No. 12, 13.06.2005, p. 4370-4378.

Research output: Contribution to journalArticleResearchpeer review

Clausnitzer, T, Kley, EB, Tünnermann, A, Bunkowski, A, Burmeister, O, Danzmann, K, Schnabel, R, Gliech, S & Duparré, A 2005, 'Ultra low-loss low-efficiency diffraction gratings', Optics express, vol. 13, no. 12, pp. 4370-4378. https://doi.org/10.1364/OPEX.13.004370
Clausnitzer, T., Kley, E. B., Tünnermann, A., Bunkowski, A., Burmeister, O., Danzmann, K., Schnabel, R., Gliech, S., & Duparré, A. (2005). Ultra low-loss low-efficiency diffraction gratings. Optics express, 13(12), 4370-4378. https://doi.org/10.1364/OPEX.13.004370
Clausnitzer T, Kley EB, Tünnermann A, Bunkowski A, Burmeister O, Danzmann K et al. Ultra low-loss low-efficiency diffraction gratings. Optics express. 2005 Jun 13;13(12):4370-4378. doi: 10.1364/OPEX.13.004370
Clausnitzer, T. ; Kley, E. B. ; Tünnermann, A. et al. / Ultra low-loss low-efficiency diffraction gratings. In: Optics express. 2005 ; Vol. 13, No. 12. pp. 4370-4378.
Download
@article{e9f5ae1975d04ff781f8ba61105981de,
title = "Ultra low-loss low-efficiency diffraction gratings",
abstract = "The realization of ultra low-loss dielectric reflection gratings with diffraction efficiencies between 7% and 0.02% is presented. By placing the grating beneath the highly reflective layerstack scattering was significantly reduced. This concept allows the all-reflective coupling of high laser radiation to high finesse cavities, thereby circumventing thermal effects caused by absorption in the substrate.",
author = "T. Clausnitzer and Kley, {E. B.} and A. T{\"u}nnermann and A. Bunkowski and O. Burmeister and K. Danzmann and R. Schnabel and S. Gliech and A. Duparr{\'e}",
year = "2005",
month = jun,
day = "13",
doi = "10.1364/OPEX.13.004370",
language = "English",
volume = "13",
pages = "4370--4378",
journal = "Optics express",
issn = "1094-4087",
publisher = "OSA - The Optical Society",
number = "12",

}

Download

TY - JOUR

T1 - Ultra low-loss low-efficiency diffraction gratings

AU - Clausnitzer, T.

AU - Kley, E. B.

AU - Tünnermann, A.

AU - Bunkowski, A.

AU - Burmeister, O.

AU - Danzmann, K.

AU - Schnabel, R.

AU - Gliech, S.

AU - Duparré, A.

PY - 2005/6/13

Y1 - 2005/6/13

N2 - The realization of ultra low-loss dielectric reflection gratings with diffraction efficiencies between 7% and 0.02% is presented. By placing the grating beneath the highly reflective layerstack scattering was significantly reduced. This concept allows the all-reflective coupling of high laser radiation to high finesse cavities, thereby circumventing thermal effects caused by absorption in the substrate.

AB - The realization of ultra low-loss dielectric reflection gratings with diffraction efficiencies between 7% and 0.02% is presented. By placing the grating beneath the highly reflective layerstack scattering was significantly reduced. This concept allows the all-reflective coupling of high laser radiation to high finesse cavities, thereby circumventing thermal effects caused by absorption in the substrate.

UR - http://www.scopus.com/inward/record.url?scp=22744442767&partnerID=8YFLogxK

U2 - 10.1364/OPEX.13.004370

DO - 10.1364/OPEX.13.004370

M3 - Article

AN - SCOPUS:22744442767

VL - 13

SP - 4370

EP - 4378

JO - Optics express

JF - Optics express

SN - 1094-4087

IS - 12

ER -