Trap density imaging of silicon wafers using a lock-in infrared camera technique

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

External Research Organisations

  • Institute for Solar Energy Research (ISFH)
View graph of relations

Details

Original languageEnglish
Title of host publicationConference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4
PublisherIEEE Computer Society
Pages932-935
Number of pages4
ISBN (print)1424400163, 9781424400164, 1-4244-0017-1
Publication statusPublished - 2006
Externally publishedYes
Event2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4) - Waikoloa, HI, United States
Duration: 7 May 200612 May 2006
Conference number: 4

Abstract

We apply a novel an imaging technique for nonrecombination active minority-carrier trapping centres in silicon wafers based on lock-in infrared thermography. Measurements on Czochralski silicon wafers show that the trap density is highly inhomogenous and correlates with oxygen-induced striation patterns. A direct comparison of the trap density image with the corresponding recombination lifetime mapping reveals an anticorrelation of the two quantities. The application of the ITM technique to block-cast multicrystalline silicon wafers shows that the distribution of the trapping centres correlates with the dislocation density. Moreover, we find that areas with increased dislocation density often degrade during phosphorus gettering treatment. Finally, we demonstrate that one single spatially resolved measurement of the infrared emission signal of as-delivered multicrystalline silicon without surface passivation layers reveals already poorly-getterable areas, which decrease the solar cell efficiency. Hence, trap density imaging is a useful new instrument for assessing the efficiency potential of asdelivered mc-Si wafers.

ASJC Scopus subject areas

Sustainable Development Goals

Cite this

Trap density imaging of silicon wafers using a lock-in infrared camera technique. / Pohl, Peter; Schmidt, Jan; Bothe, Karsten et al.
Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society, 2006. p. 932-935 4059782.

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Pohl, P, Schmidt, J, Bothe, K & Brendel, R 2006, Trap density imaging of silicon wafers using a lock-in infrared camera technique. in Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4., 4059782, IEEE Computer Society, pp. 932-935, 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4), Waikoloa, HI, United States, 7 May 2006. https://doi.org/10.1109/WCPEC.2006.279609
Pohl, P., Schmidt, J., Bothe, K., & Brendel, R. (2006). Trap density imaging of silicon wafers using a lock-in infrared camera technique. In Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4 (pp. 932-935). Article 4059782 IEEE Computer Society. https://doi.org/10.1109/WCPEC.2006.279609
Pohl P, Schmidt J, Bothe K, Brendel R. Trap density imaging of silicon wafers using a lock-in infrared camera technique. In Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society. 2006. p. 932-935. 4059782 doi: 10.1109/WCPEC.2006.279609
Pohl, Peter ; Schmidt, Jan ; Bothe, Karsten et al. / Trap density imaging of silicon wafers using a lock-in infrared camera technique. Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4. IEEE Computer Society, 2006. pp. 932-935
Download
@inproceedings{489c9775e88f4200bd18304ff6a4c351,
title = "Trap density imaging of silicon wafers using a lock-in infrared camera technique",
abstract = "We apply a novel an imaging technique for nonrecombination active minority-carrier trapping centres in silicon wafers based on lock-in infrared thermography. Measurements on Czochralski silicon wafers show that the trap density is highly inhomogenous and correlates with oxygen-induced striation patterns. A direct comparison of the trap density image with the corresponding recombination lifetime mapping reveals an anticorrelation of the two quantities. The application of the ITM technique to block-cast multicrystalline silicon wafers shows that the distribution of the trapping centres correlates with the dislocation density. Moreover, we find that areas with increased dislocation density often degrade during phosphorus gettering treatment. Finally, we demonstrate that one single spatially resolved measurement of the infrared emission signal of as-delivered multicrystalline silicon without surface passivation layers reveals already poorly-getterable areas, which decrease the solar cell efficiency. Hence, trap density imaging is a useful new instrument for assessing the efficiency potential of asdelivered mc-Si wafers.",
author = "Peter Pohl and Jan Schmidt and Karsten Bothe and Rolf Brendel",
note = "Funding Information: Funding was provided by the State of Lower Saxony. The authors are grateful to N. Enjalbert of Photowatt Inter- national S.A.S (France) for supplying mc-Si wafers. ISFH is a member of the German Forschungsverbund Sonne- nenergie.; 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4) ; Conference date: 07-05-2006 Through 12-05-2006",
year = "2006",
doi = "10.1109/WCPEC.2006.279609",
language = "English",
isbn = "1424400163",
pages = "932--935",
booktitle = "Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4",
publisher = "IEEE Computer Society",
address = "United States",

}

Download

TY - GEN

T1 - Trap density imaging of silicon wafers using a lock-in infrared camera technique

AU - Pohl, Peter

AU - Schmidt, Jan

AU - Bothe, Karsten

AU - Brendel, Rolf

N1 - Conference code: 4

PY - 2006

Y1 - 2006

N2 - We apply a novel an imaging technique for nonrecombination active minority-carrier trapping centres in silicon wafers based on lock-in infrared thermography. Measurements on Czochralski silicon wafers show that the trap density is highly inhomogenous and correlates with oxygen-induced striation patterns. A direct comparison of the trap density image with the corresponding recombination lifetime mapping reveals an anticorrelation of the two quantities. The application of the ITM technique to block-cast multicrystalline silicon wafers shows that the distribution of the trapping centres correlates with the dislocation density. Moreover, we find that areas with increased dislocation density often degrade during phosphorus gettering treatment. Finally, we demonstrate that one single spatially resolved measurement of the infrared emission signal of as-delivered multicrystalline silicon without surface passivation layers reveals already poorly-getterable areas, which decrease the solar cell efficiency. Hence, trap density imaging is a useful new instrument for assessing the efficiency potential of asdelivered mc-Si wafers.

AB - We apply a novel an imaging technique for nonrecombination active minority-carrier trapping centres in silicon wafers based on lock-in infrared thermography. Measurements on Czochralski silicon wafers show that the trap density is highly inhomogenous and correlates with oxygen-induced striation patterns. A direct comparison of the trap density image with the corresponding recombination lifetime mapping reveals an anticorrelation of the two quantities. The application of the ITM technique to block-cast multicrystalline silicon wafers shows that the distribution of the trapping centres correlates with the dislocation density. Moreover, we find that areas with increased dislocation density often degrade during phosphorus gettering treatment. Finally, we demonstrate that one single spatially resolved measurement of the infrared emission signal of as-delivered multicrystalline silicon without surface passivation layers reveals already poorly-getterable areas, which decrease the solar cell efficiency. Hence, trap density imaging is a useful new instrument for assessing the efficiency potential of asdelivered mc-Si wafers.

UR - http://www.scopus.com/inward/record.url?scp=41749125200&partnerID=8YFLogxK

U2 - 10.1109/WCPEC.2006.279609

DO - 10.1109/WCPEC.2006.279609

M3 - Conference contribution

AN - SCOPUS:41749125200

SN - 1424400163

SN - 9781424400164

SN - 1-4244-0017-1

SP - 932

EP - 935

BT - Conference Record of the 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion, WCPEC-4

PB - IEEE Computer Society

T2 - 2006 IEEE 4th World Conference on Photovoltaic Energy Conversion (WCPEC-4)

Y2 - 7 May 2006 through 12 May 2006

ER -

By the same author(s)