Details
| Original language | English |
|---|---|
| Article number | 221604 |
| Journal | Applied Physics Letters |
| Volume | 102 |
| Issue number | 22 |
| Publication status | Published - 3 Jun 2013 |
Abstract
Nowadays, Ion Beam Sputter (IBS) processes are very well optimized on an empirical basis. To achieve further progresses, a modification of the IBS process by guiding the coating material using an axial magnetic field and an additional electrical field has been studied. The electro-magnetic (EM) field leads to a significant change in plasma properties and deposition rate distributions, whereas an increase in deposition rate along the centerline of the axial EM field around 150% was observed. These fundamental studies on the prototype are the basis for the development of an applicable and workable design of a separation device.
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Physics and Astronomy (miscellaneous)
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In: Applied Physics Letters, Vol. 102, No. 22, 221604, 03.06.2013.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Towards an electro-magnetic field separation of deposited material implemented in an ion beam sputter process
AU - Malobabic, Sina
AU - Jupé, Marco
AU - Ristau, Detlev
N1 - Funding information: This work was financially supported by the Deutsche Forschungsgesellschaft (DFG) within the cluster of excellence 201 Quest.
PY - 2013/6/3
Y1 - 2013/6/3
N2 - Nowadays, Ion Beam Sputter (IBS) processes are very well optimized on an empirical basis. To achieve further progresses, a modification of the IBS process by guiding the coating material using an axial magnetic field and an additional electrical field has been studied. The electro-magnetic (EM) field leads to a significant change in plasma properties and deposition rate distributions, whereas an increase in deposition rate along the centerline of the axial EM field around 150% was observed. These fundamental studies on the prototype are the basis for the development of an applicable and workable design of a separation device.
AB - Nowadays, Ion Beam Sputter (IBS) processes are very well optimized on an empirical basis. To achieve further progresses, a modification of the IBS process by guiding the coating material using an axial magnetic field and an additional electrical field has been studied. The electro-magnetic (EM) field leads to a significant change in plasma properties and deposition rate distributions, whereas an increase in deposition rate along the centerline of the axial EM field around 150% was observed. These fundamental studies on the prototype are the basis for the development of an applicable and workable design of a separation device.
UR - http://www.scopus.com/inward/record.url?scp=84879112593&partnerID=8YFLogxK
U2 - 10.1063/1.4807793
DO - 10.1063/1.4807793
M3 - Article
AN - SCOPUS:84879112593
VL - 102
JO - Applied Physics Letters
JF - Applied Physics Letters
SN - 0003-6951
IS - 22
M1 - 221604
ER -