Details
| Original language | English |
|---|---|
| Title of host publication | Laser-Induced Damage in Optical Materials: 1999 |
| Subtitle of host publication | 4 - 7 October 1999, Boulder, Colorado ; proceedings |
| Place of Publication | Bellingham |
| Publisher | SPIE |
| Pages | 118-127 |
| Number of pages | 10 |
| ISBN (print) | 0-8194-3508-2 |
| Publication status | Published - 3 Mar 2000 |
| Externally published | Yes |
| Event | 31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999' - Boulder, CO, USA Duration: 4 Oct 1999 → 7 Oct 1999 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Publisher | SPIE |
| Volume | 3902 |
| ISSN (Print) | 0277-786X |
Abstract
Light scattering is an optical loss mechanism, which reduces the efficiency of imaging systems and beam guiding arrangements in many applications of high power excimer lasers. Therefore, the measurement of total scattering by optical components plays an important role for the development and optimization of thin film components and high power optics for the DUV/VUV-spectral range. In this work, a set-up for the measurement of total scattering (TS) is described and the limitations of the different functional parts are considered. The imaging properties of the Coblentz hemisphere, which is employed for collection of the scattered radiation from the specimen, are investigated in respect to the precision of the scatter measurements in the DUV/VUV spectral range. Also, the technical demands for the beam preparation system, the signal detection and the calibration of the set up are compared to specifications of the current Draft International Standard ISO/DIS 13696 for the measurement of total scattering. The study is concluded by typical TS measurements at 193 nm and preliminary results for scatter measurements at 157 nm.
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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Laser-Induced Damage in Optical Materials: 1999: 4 - 7 October 1999, Boulder, Colorado ; proceedings. Bellingham: SPIE, 2000. p. 118-127 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 3902).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Total scatter losses of optical components in the DUV/VUV spectral range
AU - Kadkhoda, Puja
AU - Müller, Arno
AU - Ristau, Detlev
PY - 2000/3/3
Y1 - 2000/3/3
N2 - Light scattering is an optical loss mechanism, which reduces the efficiency of imaging systems and beam guiding arrangements in many applications of high power excimer lasers. Therefore, the measurement of total scattering by optical components plays an important role for the development and optimization of thin film components and high power optics for the DUV/VUV-spectral range. In this work, a set-up for the measurement of total scattering (TS) is described and the limitations of the different functional parts are considered. The imaging properties of the Coblentz hemisphere, which is employed for collection of the scattered radiation from the specimen, are investigated in respect to the precision of the scatter measurements in the DUV/VUV spectral range. Also, the technical demands for the beam preparation system, the signal detection and the calibration of the set up are compared to specifications of the current Draft International Standard ISO/DIS 13696 for the measurement of total scattering. The study is concluded by typical TS measurements at 193 nm and preliminary results for scatter measurements at 157 nm.
AB - Light scattering is an optical loss mechanism, which reduces the efficiency of imaging systems and beam guiding arrangements in many applications of high power excimer lasers. Therefore, the measurement of total scattering by optical components plays an important role for the development and optimization of thin film components and high power optics for the DUV/VUV-spectral range. In this work, a set-up for the measurement of total scattering (TS) is described and the limitations of the different functional parts are considered. The imaging properties of the Coblentz hemisphere, which is employed for collection of the scattered radiation from the specimen, are investigated in respect to the precision of the scatter measurements in the DUV/VUV spectral range. Also, the technical demands for the beam preparation system, the signal detection and the calibration of the set up are compared to specifications of the current Draft International Standard ISO/DIS 13696 for the measurement of total scattering. The study is concluded by typical TS measurements at 193 nm and preliminary results for scatter measurements at 157 nm.
UR - http://www.scopus.com/inward/record.url?scp=0033871859&partnerID=8YFLogxK
U2 - 10.1117/12.379308
DO - 10.1117/12.379308
M3 - Conference contribution
AN - SCOPUS:0033871859
SN - 0-8194-3508-2
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 118
EP - 127
BT - Laser-Induced Damage in Optical Materials: 1999
PB - SPIE
CY - Bellingham
T2 - 31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999'
Y2 - 4 October 1999 through 7 October 1999
ER -