Tilted magnetic field studies of spin- and valley-splittings in Si/Si1-xGex heterostructures

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External Research Organisations

  • Max Planck Institute for Solid State Research (MPI-FKF)
  • Mercedes-Benz Group AG
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Details

Original languageEnglish
Pages (from-to)542-546
Number of pages5
JournalSurface science
Volume361-362
Publication statusPublished - 20 Jul 1996
Externally publishedYes

Abstract

Magnetotransport measurements on the 2DEG of a Si/Si1-xGex heterostructure with an electron mobility of 32m2/Vs are presented. The coincidence method in a tilted magnetic field is used to determine the effective g factor. In the filling factor range 16 ≤ v ≤ 28 an almost constant effective g factor of g* = 3.39 is found. For lower filling factors, g* increases. Activation energy experiments at different tilting angles show that the size of the valley splitting depends only on the normal component of the magnetic field. Around filling factor v = 3 in a tilted field, an overshoot occurs in the Hall resistance, which is attributed to level crossings as a consequence of the exchange enhancement effects of spin- and valley-splitting.

Keywords

    Electrical transport, Electrical transport measurements, Hall effect, Heterojunctions, Quantum effects, Semiconductor-semiconductor heterojunctions, Silicon-germanium

ASJC Scopus subject areas

Cite this

Tilted magnetic field studies of spin- and valley-splittings in Si/Si1-xGex heterostructures. / Weitz, P.; Haug, R. J.; Von Klitzing, K. et al.
In: Surface science, Vol. 361-362, 20.07.1996, p. 542-546.

Research output: Contribution to journalArticleResearchpeer review

Weitz P, Haug RJ, Von Klitzing K, Schäffler F. Tilted magnetic field studies of spin- and valley-splittings in Si/Si1-xGex heterostructures. Surface science. 1996 Jul 20;361-362:542-546. doi: 10.1016/0039-6028(96)00465-7
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AU - Weitz, P.

AU - Haug, R. J.

AU - Von Klitzing, K.

AU - Schäffler, F.

PY - 1996/7/20

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KW - Heterojunctions

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