Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • Holger Blaschke
  • Winfried Arens
  • Detlev Ristau
  • Sven Martin
  • Bincheng Li
  • Eberhard Welsch

External Research Organisations

  • Friedrich Schiller University Jena
  • Laser Zentrum Hannover e.V. (LZH)
View graph of relations

Details

Original languageEnglish
Title of host publicationLaser-induced damage in optical materials
Subtitle of host publication1999 : 4 - 7 October 1999, Boulder, Colorado ; proceedings
Place of PublicationBellingham
PublisherSPIE
Pages242-249
Number of pages8
ISBN (print)0-8194-3508-2
Publication statusPublished - 3 Mar 2000
Externally publishedYes
Event31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999' - Boulder, CO, USA
Duration: 4 Oct 19997 Oct 1999

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
PublisherSPIE
Volume3902
ISSN (Print)0277-786X

Abstract

HR layer stacks with increasing number of HL pairs of fluoride materials deposited on different substrates have been successfully investigated with respect to the laser radiation damage threshold at 248 nm and 193 nm. In this paper the investigation has been extended on resonant as well as non-resonant oxide coatings deposited by ion beam sputtering (IBS). Compared to conventional evaporation and plasma ion assisted evaporation technique, IBS coatings exhibit a higher packing density, thus preventing water to enter the film which would degrade the quality of the coatings. In contrast, the thermal stress is increased in IBS layer stacks. The measurements were carried out by use of the pulsed thermal lens technique enabling us to measure the advent of optical breakdown induced by laser fluences in the subdamage range.

ASJC Scopus subject areas

Cite this

Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique. / Blaschke, Holger; Arens, Winfried; Ristau, Detlev et al.
Laser-induced damage in optical materials: 1999 : 4 - 7 October 1999, Boulder, Colorado ; proceedings. Bellingham: SPIE, 2000. p. 242-249 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 3902).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Blaschke, H, Arens, W, Ristau, D, Martin, S, Li, B & Welsch, E 2000, Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique. in Laser-induced damage in optical materials: 1999 : 4 - 7 October 1999, Boulder, Colorado ; proceedings. Proceedings of SPIE - The International Society for Optical Engineering, vol. 3902, SPIE, Bellingham, pp. 242-249, 31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999', Boulder, CO, USA, 4 Oct 1999. https://doi.org/10.1117/12.379306
Blaschke, H., Arens, W., Ristau, D., Martin, S., Li, B., & Welsch, E. (2000). Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique. In Laser-induced damage in optical materials: 1999 : 4 - 7 October 1999, Boulder, Colorado ; proceedings (pp. 242-249). (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 3902). SPIE. https://doi.org/10.1117/12.379306
Blaschke H, Arens W, Ristau D, Martin S, Li B, Welsch E. Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique. In Laser-induced damage in optical materials: 1999 : 4 - 7 October 1999, Boulder, Colorado ; proceedings. Bellingham: SPIE. 2000. p. 242-249. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.379306
Blaschke, Holger ; Arens, Winfried ; Ristau, Detlev et al. / Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique. Laser-induced damage in optical materials: 1999 : 4 - 7 October 1999, Boulder, Colorado ; proceedings. Bellingham : SPIE, 2000. pp. 242-249 (Proceedings of SPIE - The International Society for Optical Engineering).
Download
@inproceedings{4666c153bed242069d433f0c91c04837,
title = "Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique",
abstract = "HR layer stacks with increasing number of HL pairs of fluoride materials deposited on different substrates have been successfully investigated with respect to the laser radiation damage threshold at 248 nm and 193 nm. In this paper the investigation has been extended on resonant as well as non-resonant oxide coatings deposited by ion beam sputtering (IBS). Compared to conventional evaporation and plasma ion assisted evaporation technique, IBS coatings exhibit a higher packing density, thus preventing water to enter the film which would degrade the quality of the coatings. In contrast, the thermal stress is increased in IBS layer stacks. The measurements were carried out by use of the pulsed thermal lens technique enabling us to measure the advent of optical breakdown induced by laser fluences in the subdamage range.",
author = "Holger Blaschke and Winfried Arens and Detlev Ristau and Sven Martin and Bincheng Li and Eberhard Welsch",
year = "2000",
month = mar,
day = "3",
doi = "10.1117/12.379306",
language = "English",
isbn = "0-8194-3508-2",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
pages = "242--249",
booktitle = "Laser-induced damage in optical materials",
address = "United States",
note = "31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999' ; Conference date: 04-10-1999 Through 07-10-1999",

}

Download

TY - GEN

T1 - Thickness dependence of damage thresholds for 193 nm dielectric mirrors by predamage sensitive photothermal technique

AU - Blaschke, Holger

AU - Arens, Winfried

AU - Ristau, Detlev

AU - Martin, Sven

AU - Li, Bincheng

AU - Welsch, Eberhard

PY - 2000/3/3

Y1 - 2000/3/3

N2 - HR layer stacks with increasing number of HL pairs of fluoride materials deposited on different substrates have been successfully investigated with respect to the laser radiation damage threshold at 248 nm and 193 nm. In this paper the investigation has been extended on resonant as well as non-resonant oxide coatings deposited by ion beam sputtering (IBS). Compared to conventional evaporation and plasma ion assisted evaporation technique, IBS coatings exhibit a higher packing density, thus preventing water to enter the film which would degrade the quality of the coatings. In contrast, the thermal stress is increased in IBS layer stacks. The measurements were carried out by use of the pulsed thermal lens technique enabling us to measure the advent of optical breakdown induced by laser fluences in the subdamage range.

AB - HR layer stacks with increasing number of HL pairs of fluoride materials deposited on different substrates have been successfully investigated with respect to the laser radiation damage threshold at 248 nm and 193 nm. In this paper the investigation has been extended on resonant as well as non-resonant oxide coatings deposited by ion beam sputtering (IBS). Compared to conventional evaporation and plasma ion assisted evaporation technique, IBS coatings exhibit a higher packing density, thus preventing water to enter the film which would degrade the quality of the coatings. In contrast, the thermal stress is increased in IBS layer stacks. The measurements were carried out by use of the pulsed thermal lens technique enabling us to measure the advent of optical breakdown induced by laser fluences in the subdamage range.

UR - http://www.scopus.com/inward/record.url?scp=0033878130&partnerID=8YFLogxK

U2 - 10.1117/12.379306

DO - 10.1117/12.379306

M3 - Conference contribution

AN - SCOPUS:0033878130

SN - 0-8194-3508-2

T3 - Proceedings of SPIE - The International Society for Optical Engineering

SP - 242

EP - 249

BT - Laser-induced damage in optical materials

PB - SPIE

CY - Bellingham

T2 - 31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999'

Y2 - 4 October 1999 through 7 October 1999

ER -