Details
Original language | English |
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Pages (from-to) | 1860-1866 |
Number of pages | 7 |
Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
Volume | 20 |
Issue number | 6 |
Publication status | Published - 6 Nov 2002 |
Externally published | Yes |
Abstract
The effects of thermal annealing on uncapped and Si-capped Pr2O3 films deposited on silicon substrate were investigated. For uncapped films, a rapid diffusion of Si out of the substrate was observed at temperatures starting from 700°C. The diffused Si oxidized and formed a Pr2O3-Prx-Oy-Siz mixture. The excess Si diffused through the film and formed a SiO2 rich layer on the surface.
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Materials Science(all)
- Surfaces, Coatings and Films
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In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 20, No. 6, 06.11.2002, p. 1860-1866.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Thermal stability of Pr2O3 films grown on Si(100) substrate
AU - Goryachko, A.
AU - Liu, J. P.
AU - Krüger, D.
AU - Osten, H. J.
AU - Bugiel, E.
AU - Kurps, R.
AU - Melnik, V.
PY - 2002/11/6
Y1 - 2002/11/6
N2 - The effects of thermal annealing on uncapped and Si-capped Pr2O3 films deposited on silicon substrate were investigated. For uncapped films, a rapid diffusion of Si out of the substrate was observed at temperatures starting from 700°C. The diffused Si oxidized and formed a Pr2O3-Prx-Oy-Siz mixture. The excess Si diffused through the film and formed a SiO2 rich layer on the surface.
AB - The effects of thermal annealing on uncapped and Si-capped Pr2O3 films deposited on silicon substrate were investigated. For uncapped films, a rapid diffusion of Si out of the substrate was observed at temperatures starting from 700°C. The diffused Si oxidized and formed a Pr2O3-Prx-Oy-Siz mixture. The excess Si diffused through the film and formed a SiO2 rich layer on the surface.
UR - http://www.scopus.com/inward/record.url?scp=0036865362&partnerID=8YFLogxK
U2 - 10.1116/1.1507332
DO - 10.1116/1.1507332
M3 - Article
AN - SCOPUS:0036865362
VL - 20
SP - 1860
EP - 1866
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SN - 0734-2101
IS - 6
ER -