Details
| Original language | English |
|---|---|
| Title of host publication | 47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials |
| Subtitle of host publication | 2015 |
| Publisher | SPIE |
| ISBN (electronic) | 9781628418323 |
| Publication status | Published - 23 Nov 2015 |
| Externally published | Yes |
| Event | 47th Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2015 - Boulder, United States Duration: 27 Sept 2015 → 30 Sept 2015 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 9632 |
| ISSN (Print) | 0277-786X |
| ISSN (electronic) | 1996-756X |
Abstract
The role of thin-film interfaces in the near-ultraviolet absorption and pulsed-laser-induced damage was studied for ion-beam-sputtered coatings comprised of HfO2 and SiO2 thin-film pairs. To separate contributions from the bulk of the film and from interfacial areas, absorption and damage threshold were measured for a one-wave (355-nm)-thick HfO2 single-layer film and for a film containing seven narrow HfO2 layers separated by SiO2 layers. The seven-layer film was designed to have a total optical thickness of HfO2 layers equal to one wave at 355 nm and an E-field peak and average intensity similar to a single-layer HfO2 film. Absorption in both types of films was measured using laser calorimetry and photothermal heterodyne imaging. The results showed a small contribution to total absorption from thinfilm interfaces, as compared to HfO2 film material. The relevance of obtained absorption data to coating near-ultraviolet, nanosecond-pulse laser damage was verified by measuring the damage threshold and characterizing damage morphology. The results of this study revealed a higher damage resistance in the seven-layer coating as compared to the single-layer HfO2 film, in agreement with data recently reported for similarly designed electron-beam-deposited coatings. The results are explained through the similarity of interfacial film structure and structure formed during the co-deposition of HfO2 and SiO2 materials.
Keywords
- absorption, interfaces, laser damage, Thin films
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
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47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2015. SPIE, 2015. 96320B (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9632).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - The role of film interfaces in near-ultraviolet absorption and pulsed-laser damage in ion-beam-sputtered coatings based on HfO2/SiO2 thin-film pairs
AU - Papernov, S.
AU - Kozlov, A. A.
AU - Oliver, J. B.
AU - Smith, C.
AU - Jensen, L.
AU - Ristau, Detlev
AU - Gunster, Stefan
AU - Madebach, H.
N1 - Funding information: This material is based upon work supported by the Department of Energy National Nuclear Security Administration under Award Number DE-NA0001944, the University of Rochester, and the New York State Energy Research and Development Authority. This work is also supported by the German Federal Ministry of Education & Research within Ultra-Life project under contract # 13N11558. The support of DOE does not constitute an endorsement by DOE of the views expressed in this article. This material is based upon work supported by the Department of Energy National Nuclear Security Administration under Award Number DE-NA0001944, the University of Rochester, and the New York State Energy Research and Development Authority. This work is also supported by the German Federal Ministry of Education and Research within Ultra-Life project under contract # 13N11558. The support of DOE does not constitute an endorsement by DOE of the views expressed in this article.
PY - 2015/11/23
Y1 - 2015/11/23
N2 - The role of thin-film interfaces in the near-ultraviolet absorption and pulsed-laser-induced damage was studied for ion-beam-sputtered coatings comprised of HfO2 and SiO2 thin-film pairs. To separate contributions from the bulk of the film and from interfacial areas, absorption and damage threshold were measured for a one-wave (355-nm)-thick HfO2 single-layer film and for a film containing seven narrow HfO2 layers separated by SiO2 layers. The seven-layer film was designed to have a total optical thickness of HfO2 layers equal to one wave at 355 nm and an E-field peak and average intensity similar to a single-layer HfO2 film. Absorption in both types of films was measured using laser calorimetry and photothermal heterodyne imaging. The results showed a small contribution to total absorption from thinfilm interfaces, as compared to HfO2 film material. The relevance of obtained absorption data to coating near-ultraviolet, nanosecond-pulse laser damage was verified by measuring the damage threshold and characterizing damage morphology. The results of this study revealed a higher damage resistance in the seven-layer coating as compared to the single-layer HfO2 film, in agreement with data recently reported for similarly designed electron-beam-deposited coatings. The results are explained through the similarity of interfacial film structure and structure formed during the co-deposition of HfO2 and SiO2 materials.
AB - The role of thin-film interfaces in the near-ultraviolet absorption and pulsed-laser-induced damage was studied for ion-beam-sputtered coatings comprised of HfO2 and SiO2 thin-film pairs. To separate contributions from the bulk of the film and from interfacial areas, absorption and damage threshold were measured for a one-wave (355-nm)-thick HfO2 single-layer film and for a film containing seven narrow HfO2 layers separated by SiO2 layers. The seven-layer film was designed to have a total optical thickness of HfO2 layers equal to one wave at 355 nm and an E-field peak and average intensity similar to a single-layer HfO2 film. Absorption in both types of films was measured using laser calorimetry and photothermal heterodyne imaging. The results showed a small contribution to total absorption from thinfilm interfaces, as compared to HfO2 film material. The relevance of obtained absorption data to coating near-ultraviolet, nanosecond-pulse laser damage was verified by measuring the damage threshold and characterizing damage morphology. The results of this study revealed a higher damage resistance in the seven-layer coating as compared to the single-layer HfO2 film, in agreement with data recently reported for similarly designed electron-beam-deposited coatings. The results are explained through the similarity of interfacial film structure and structure formed during the co-deposition of HfO2 and SiO2 materials.
KW - absorption
KW - interfaces
KW - laser damage
KW - Thin films
UR - http://www.scopus.com/inward/record.url?scp=84964959799&partnerID=8YFLogxK
U2 - 10.1117/12.2196654
DO - 10.1117/12.2196654
M3 - Conference contribution
AN - SCOPUS:84964959799
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - 47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
PB - SPIE
T2 - 47th Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2015
Y2 - 27 September 2015 through 30 September 2015
ER -