Supersaturated carbon in silicon and silicon/germanium alloys

Research output: Contribution to journalArticleResearchpeer review

Authors

  • H. J. Osten

External Research Organisations

  • Leibniz Institute for High Performance Microelectronics (IHP)
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Details

Original languageEnglish
Pages (from-to)268-274
Number of pages7
JournalMaterials Science and Engineering B
Volume36
Issue number1-3
Publication statusE-pub ahead of print - 5 Feb 1999
Externally publishedYes

Abstract

The growth and properties of Si1-yCy and Si1-x-yGexCy alloys pseudomorphically strained on Si(001) will be reviewed. Although the bulk solubility of carbon in silicon is small, epitaxial layers of more than 1 at.%C can be fabricated. Most of the incorporated C atoms occupy substitutional positions and, therefore, allow strain manipulation; including the growth of an inversely strained Si1-x-yGexCy layer. The mechanical properties as well as the influence of C atoms on band structure will be discussed. Finally we will present an atomistic picture of a fully strain-compensated SiGeC layer.

Keywords

    Alloys, Carbon, Silicon, Supersaturation

ASJC Scopus subject areas

Cite this

Supersaturated carbon in silicon and silicon/germanium alloys. / Osten, H. J.
In: Materials Science and Engineering B, Vol. 36, No. 1-3, 05.02.1999, p. 268-274.

Research output: Contribution to journalArticleResearchpeer review

Osten HJ. Supersaturated carbon in silicon and silicon/germanium alloys. Materials Science and Engineering B. 1999 Feb 5;36(1-3):268-274. Epub 1999 Feb 5. doi: 10.1016/0921-5107(95)01272-9
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