Strong localization in weakly disordered epitaxial graphene

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Authors

  • Diana Slawig
  • Markus Gruschwitz
  • Christoph Tegenkamp

Research Organisations

External Research Organisations

  • Chemnitz University of Technology (CUT)
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Details

Original languageEnglish
Article number121801
JournalSurface Science
Volume707
Early online date27 Jan 2021
Publication statusPublished - May 2021

Abstract

We studied the adsorption of atomic hydrogen on monolayer graphene and quasi free monolayer graphene, epitaxially grown on SiC(0001). By means of in-situ surface transport measurements, a metal-insulator transition was found on both n- and p-type doped two dimensional electron systems. The detailed analysis of the temperature dependent resistivity revealed that even ultra-low concentrations (nH≈1012 cm−2) of locally chemisorbed H-clusters act as effective scattering centers for the propagating electrons and limit the mean-free path L0∝1/nH. Despite the weak disorder due to adsorption, strong localization was found. The activation energy for destroying the phase coherence within the system is around 30 meV. Our analysis rules out the formation of a band insulator or even a”bad metal” due to adsorption of hydrogen.

Keywords

    Atomic hydrogen adsorption, Graphene, Ioffe-Regel criterion, Metal insulator transition, Surface transport

ASJC Scopus subject areas

Cite this

Strong localization in weakly disordered epitaxial graphene. / Slawig, Diana; Gruschwitz, Markus; Tegenkamp, Christoph.
In: Surface Science, Vol. 707, 121801, 05.2021.

Research output: Contribution to journalArticleResearchpeer review

Slawig D, Gruschwitz M, Tegenkamp C. Strong localization in weakly disordered epitaxial graphene. Surface Science. 2021 May;707:121801. Epub 2021 Jan 27. doi: 10.1016/j.susc.2021.121801
Slawig, Diana ; Gruschwitz, Markus ; Tegenkamp, Christoph. / Strong localization in weakly disordered epitaxial graphene. In: Surface Science. 2021 ; Vol. 707.
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