Strain-stabilized structures on silicon grown with MBE

Research output: Contribution to journalArticleResearchpeer review

Authors

  • H. J. Osten
  • H. Rücker
  • M. Methfessel
  • E. Bugiel
  • S. Ruvimov
  • G. Lippert

External Research Organisations

  • Leibniz Institute for High Performance Microelectronics (IHP)
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Details

Original languageEnglish
Pages (from-to)405-409
Number of pages5
JournalJournal of crystal growth
Volume157
Issue number1-4
Publication statusPublished - Dec 1995
Externally publishedYes

Abstract

Calculations predict that thin layers of certain ordered SinC (n ≥ 4) structures embedded in silicon are considerably more stable than isolated C impurities. These pseudomorphic layers (with carbon concentrations up to 20%) are thermodynamically forbidden. They can only exist due to strain-stabilization. Such layers were grown by molecular beam epitaxy and characterized with high resolution electron microscopy and X-ray photoelectron spectroscopy. The experimental results support the theoretical predictions. Carbon atoms deposited on silicon at moderate temperatures tend not to stay at the surface, but instead readily migrate into the crystal to form a narrow region with high carbon concentration. The energy barrier for this process is much smaller than that for diffusion in the bulk.

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Cite this

Strain-stabilized structures on silicon grown with MBE. / Osten, H. J.; Rücker, H.; Methfessel, M. et al.
In: Journal of crystal growth, Vol. 157, No. 1-4, 12.1995, p. 405-409.

Research output: Contribution to journalArticleResearchpeer review

Osten, HJ, Rücker, H, Methfessel, M, Bugiel, E, Ruvimov, S & Lippert, G 1995, 'Strain-stabilized structures on silicon grown with MBE', Journal of crystal growth, vol. 157, no. 1-4, pp. 405-409. https://doi.org/10.1016/0022-0248(95)00332-0
Osten, H. J., Rücker, H., Methfessel, M., Bugiel, E., Ruvimov, S., & Lippert, G. (1995). Strain-stabilized structures on silicon grown with MBE. Journal of crystal growth, 157(1-4), 405-409. https://doi.org/10.1016/0022-0248(95)00332-0
Osten HJ, Rücker H, Methfessel M, Bugiel E, Ruvimov S, Lippert G. Strain-stabilized structures on silicon grown with MBE. Journal of crystal growth. 1995 Dec;157(1-4):405-409. doi: 10.1016/0022-0248(95)00332-0
Osten, H. J. ; Rücker, H. ; Methfessel, M. et al. / Strain-stabilized structures on silicon grown with MBE. In: Journal of crystal growth. 1995 ; Vol. 157, No. 1-4. pp. 405-409.
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AU - Osten, H. J.

AU - Rücker, H.

AU - Methfessel, M.

AU - Bugiel, E.

AU - Ruvimov, S.

AU - Lippert, G.

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AB - Calculations predict that thin layers of certain ordered SinC (n ≥ 4) structures embedded in silicon are considerably more stable than isolated C impurities. These pseudomorphic layers (with carbon concentrations up to 20%) are thermodynamically forbidden. They can only exist due to strain-stabilization. Such layers were grown by molecular beam epitaxy and characterized with high resolution electron microscopy and X-ray photoelectron spectroscopy. The experimental results support the theoretical predictions. Carbon atoms deposited on silicon at moderate temperatures tend not to stay at the surface, but instead readily migrate into the crystal to form a narrow region with high carbon concentration. The energy barrier for this process is much smaller than that for diffusion in the bulk.

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