Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process

Research output: Contribution to journalArticleResearchpeer review

Authors

  • Sina Malobabic
  • Marco Jupé
  • Detlev Ristau

External Research Organisations

  • Laser Zentrum Hannover e.V. (LZH)
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Details

Original languageEnglish
Article numbere16044
JournalLight: Science and Applications
Volume5
Publication statusPublished - 12 Nov 2015

Abstract

In the present state of the art, ion beam sputtering is used to produce low-loss dielectric optics. During the manufacturing of a dielectric layer stack, the deposition material must be changed, which requires rapid mechanical movement of vacuum components. These mechanical components can be regarded as a risk factor for contamination during the coating process, which limits the quality of high-end laser components. To minimize the particle contamination, we present a novel deposition concept that does not require movable components to change the coating material during the coating process. A magnetic field guiding technique has been developed, which enables the tuning of the refractive index in the layer structure by sputtering mixtures with varying compositions of two materials using a single-ion source. The versatility of this new concept is demonstrated for a high-reflection mirror.

Keywords

    EM field separation, ion beam sputtering, plasma guiding

ASJC Scopus subject areas

Cite this

Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process. / Malobabic, Sina; Jupé, Marco; Ristau, Detlev.
In: Light: Science and Applications, Vol. 5, e16044, 12.11.2015.

Research output: Contribution to journalArticleResearchpeer review

Malobabic S, Jupé M, Ristau D. Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process. Light: Science and Applications. 2015 Nov 12;5:e16044. doi: 10.1038/lsa.2016.44
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@article{1bdafaf27dde4745accdcfcbf5e8020a,
title = "Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process",
abstract = "In the present state of the art, ion beam sputtering is used to produce low-loss dielectric optics. During the manufacturing of a dielectric layer stack, the deposition material must be changed, which requires rapid mechanical movement of vacuum components. These mechanical components can be regarded as a risk factor for contamination during the coating process, which limits the quality of high-end laser components. To minimize the particle contamination, we present a novel deposition concept that does not require movable components to change the coating material during the coating process. A magnetic field guiding technique has been developed, which enables the tuning of the refractive index in the layer structure by sputtering mixtures with varying compositions of two materials using a single-ion source. The versatility of this new concept is demonstrated for a high-reflection mirror.",
keywords = "EM field separation, ion beam sputtering, plasma guiding",
author = "Sina Malobabic and Marco Jup{\'e} and Detlev Ristau",
note = "Funding information: This work was supported by the Deutsche Forschungsgemeinschaft (DFG) within the framework of the Cluster of Excellence QUEST Project 201.",
year = "2015",
month = nov,
day = "12",
doi = "10.1038/lsa.2016.44",
language = "English",
volume = "5",
journal = "Light: Science and Applications",
issn = "2047-7538",
publisher = "Nature Publishing Group",

}

Download

TY - JOUR

T1 - Spatial separation effects in a guiding procedure in a modified ion-beam-sputtering process

AU - Malobabic, Sina

AU - Jupé, Marco

AU - Ristau, Detlev

N1 - Funding information: This work was supported by the Deutsche Forschungsgemeinschaft (DFG) within the framework of the Cluster of Excellence QUEST Project 201.

PY - 2015/11/12

Y1 - 2015/11/12

N2 - In the present state of the art, ion beam sputtering is used to produce low-loss dielectric optics. During the manufacturing of a dielectric layer stack, the deposition material must be changed, which requires rapid mechanical movement of vacuum components. These mechanical components can be regarded as a risk factor for contamination during the coating process, which limits the quality of high-end laser components. To minimize the particle contamination, we present a novel deposition concept that does not require movable components to change the coating material during the coating process. A magnetic field guiding technique has been developed, which enables the tuning of the refractive index in the layer structure by sputtering mixtures with varying compositions of two materials using a single-ion source. The versatility of this new concept is demonstrated for a high-reflection mirror.

AB - In the present state of the art, ion beam sputtering is used to produce low-loss dielectric optics. During the manufacturing of a dielectric layer stack, the deposition material must be changed, which requires rapid mechanical movement of vacuum components. These mechanical components can be regarded as a risk factor for contamination during the coating process, which limits the quality of high-end laser components. To minimize the particle contamination, we present a novel deposition concept that does not require movable components to change the coating material during the coating process. A magnetic field guiding technique has been developed, which enables the tuning of the refractive index in the layer structure by sputtering mixtures with varying compositions of two materials using a single-ion source. The versatility of this new concept is demonstrated for a high-reflection mirror.

KW - EM field separation

KW - ion beam sputtering

KW - plasma guiding

UR - http://www.scopus.com/inward/record.url?scp=84960914708&partnerID=8YFLogxK

U2 - 10.1038/lsa.2016.44

DO - 10.1038/lsa.2016.44

M3 - Article

AN - SCOPUS:84960914708

VL - 5

JO - Light: Science and Applications

JF - Light: Science and Applications

SN - 2047-7538

M1 - e16044

ER -