Soft Cleaning by In Vacuo Ultraviolet Radiation Combined with Molecular Hydrogen Gas before Molecular Beam Epitaxial Layer Growth

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Authors

  • G. Lippert
  • H. J. Thieme
  • H. J. Osten

External Research Organisations

  • Leibniz Institute for High Performance Microelectronics (IHP)
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Details

Original languageEnglish
Pages (from-to)191-195
Number of pages5
JournalJournal of the Electrochemical Society
Volume142
Issue number1
Publication statusPublished - 1995
Externally publishedYes

Abstract

A UV/hydrogen procedure performed in vacuo is able to remove adsorbed hydrocarbons from a protective silicon oxide layer prior to its sublimation. The efficiency of UV/H2~cleaning increases with increasing substrate temperature, with the time of treatment, and with increasing partial pressure of hydrogen. At least three different mechanisms give rise to the observed removing of carbon-containing contaminants: (i) thermal desorption due to the higher substrate temperature, (ii) a direct interaction between the high energy UV photons and the adsorbed species (photochemical degradation), and (iii) a mechanism based on the presence of the activated hydrogen atoms. Each single process has its own temperature dependence. This moderate in situ procedure removes preferentially weakly bonded species. It can be successfully used to clean the protective layer prior to sublimation. All wet chemical treatments before introducing the wafer into the deposition equipment can be avoided and silicon substrates as-received from the producer can be used to grow high quality epitaxial layers, which seems to be a good alternative to highly sophisticated wet chemical procedures, where recontamination during wafer loading hardly can be avoided.

ASJC Scopus subject areas

Sustainable Development Goals

Cite this

Soft Cleaning by In Vacuo Ultraviolet Radiation Combined with Molecular Hydrogen Gas before Molecular Beam Epitaxial Layer Growth. / Lippert, G.; Thieme, H. J.; Osten, H. J.
In: Journal of the Electrochemical Society, Vol. 142, No. 1, 1995, p. 191-195.

Research output: Contribution to journalArticleResearchpeer review

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Download

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