Single-electron transport in small resonant-tunneling diodes with various barrier-thickness asymmetries

Research output: Contribution to journalArticleResearchpeer review

Authors

  • T. Schmidt
  • R. Haug
  • K. Klitzing
  • A. Förster
  • H. Lüth

External Research Organisations

  • Max Planck Institute for Solid State Research (MPI-FKF)
  • Forschungszentrum Jülich
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Details

Original languageEnglish
Pages (from-to)2230-2236
Number of pages7
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume55
Issue number4
Publication statusPublished - 1 Jan 1997
Externally publishedYes

Abstract

We fabricated submicrometer-diameter double-barrier diodes from four wafers with different barrier-thickness asymmetry. All samples exhibit staircaselike features in the current-voltage characteristic at the current threshold due to single-electron tunneling. Our study focuses on the properties of the first current step which arises from tunneling through the energetically lowest discrete electron state within the double-barrier region. The analysis of the bias position of the step allows a spatial spectroscopy of the vertical position of the lowest discrete level in the double-barrier region. The magnitude of the step is in excellent agreement with theory for all barrier-thickness asymmetries whereas the broadening of the step edge exceeds the lifetime-related width of the discrete state by one order of magnitude.

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Cite this

Single-electron transport in small resonant-tunneling diodes with various barrier-thickness asymmetries. / Schmidt, T.; Haug, R.; Klitzing, K. et al.
In: Physical Review B - Condensed Matter and Materials Physics, Vol. 55, No. 4, 01.01.1997, p. 2230-2236.

Research output: Contribution to journalArticleResearchpeer review

Download
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AU - Haug, R.

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