Scaling of laser-induced contamination growth at 266nm and 355nm

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • Matthias Ließmann
  • Lars Jensen
  • Istvan Balasa
  • M. Hunnekuhl
  • A. Buttner
  • Peter Weßels
  • Jörg Neumann
  • Detlev Ristau

External Research Organisations

  • Laser Zentrum Hannover e.V. (LZH)
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Details

Original languageEnglish
Title of host publication47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
Subtitle of host publication2015
PublisherSPIE
ISBN (electronic)9781628418323
Publication statusPublished - 23 Nov 2015
Externally publishedYes
Event47th Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2015 - Boulder, United States
Duration: 27 Sept 201530 Sept 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9632
ISSN (Print)0277-786X
ISSN (electronic)1996-756X

Abstract

The growth of laser-induced contamination (LIC) on optical components in extraterrestrial missions is a known issue especially for the UV spectral region. The Laser Zentrum Hannover e.V. is responsible for the development of a pulsed laser-system operating at a wavelength of 266 nm for the ExoMars mission and for the qualification of used optics and materials regarding LIC. In this context, toluene was utilized which is an often used model contaminant in LIC studies. Test cycles based on the application of the two UV wavelengths 355 nm and 266 nm on fused silica substrates and ARcoated optics are conducted and the observed contamination effects are compared. This scaling allows for a rough estimate of the destructive influence of LIC on space optics degradation at 266 nm. Further tests will be performed with materials integrated into the ExoMars-laser-head under near-operation environmental conditions.

Keywords

    ExoMars mission, Laser induced contamination, space qualification

ASJC Scopus subject areas

Cite this

Scaling of laser-induced contamination growth at 266nm and 355nm. / Ließmann, Matthias; Jensen, Lars; Balasa, Istvan et al.
47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2015. SPIE, 2015. 96321Z (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9632).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Ließmann, M, Jensen, L, Balasa, I, Hunnekuhl, M, Buttner, A, Weßels, P, Neumann, J & Ristau, D 2015, Scaling of laser-induced contamination growth at 266nm and 355nm. in 47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2015., 96321Z, Proceedings of SPIE - The International Society for Optical Engineering, vol. 9632, SPIE, 47th Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials: 2015, Boulder, United States, 27 Sept 2015. https://doi.org/10.1117/12.2194083
Ließmann, M., Jensen, L., Balasa, I., Hunnekuhl, M., Buttner, A., Weßels, P., Neumann, J., & Ristau, D. (2015). Scaling of laser-induced contamination growth at 266nm and 355nm. In 47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2015 Article 96321Z (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9632). SPIE. https://doi.org/10.1117/12.2194083
Ließmann M, Jensen L, Balasa I, Hunnekuhl M, Buttner A, Weßels P et al. Scaling of laser-induced contamination growth at 266nm and 355nm. In 47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2015. SPIE. 2015. 96321Z. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2194083
Ließmann, Matthias ; Jensen, Lars ; Balasa, Istvan et al. / Scaling of laser-induced contamination growth at 266nm and 355nm. 47th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2015. SPIE, 2015. (Proceedings of SPIE - The International Society for Optical Engineering).
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