Details
| Original language | English |
|---|---|
| Title of host publication | Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies |
| Subtitle of host publication | 3 - 5 August 2003, San Diego, California, USA |
| Place of Publication | Bellingham |
| Publisher | SPIE |
| Pages | 331-342 |
| Number of pages | 12 |
| ISBN (print) | 0-8194-5061-8 |
| Publication status | Published - 4 Nov 2003 |
| Event | Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies - San Diego, CA, United States Duration: 3 Aug 2003 → 5 Aug 2003 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Publisher | SPIE |
| Volume | 5188 |
| ISSN (Print) | 0277-786X |
Abstract
Depending on the choice of thin film models and measurement data used for the characterization analysis one can obtain essentially different characterization results. It is especially difficult to reliably determine refractive index wavelength dependencies in the case of low accuracy measurement data. We consider possible approaches aimed to improve a stability of refractive index determination. The ways of the verification of characterization results are also discussed. Practical examples used to illustrate the proposed approaches are connected with the most difficult case of the determination of the refractive indices of fluoride films in the VUV spectral region.
Keywords
- Optical characterization, Refractive index, Thin films
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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- BibTeX
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Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies: 3 - 5 August 2003, San Diego, California, USA. Bellingham: SPIE, 2003. p. 331-342 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 5188).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Reliable determination of wavelength dependence of thin film refractive index
AU - Tikhonravov, Alexander
AU - Trubetskov, Michael
AU - Amotchkina, Tatiana
AU - Tikhonravov, Andrei
AU - Ristau, Detlev
AU - Günster, Stefan
PY - 2003/11/4
Y1 - 2003/11/4
N2 - Depending on the choice of thin film models and measurement data used for the characterization analysis one can obtain essentially different characterization results. It is especially difficult to reliably determine refractive index wavelength dependencies in the case of low accuracy measurement data. We consider possible approaches aimed to improve a stability of refractive index determination. The ways of the verification of characterization results are also discussed. Practical examples used to illustrate the proposed approaches are connected with the most difficult case of the determination of the refractive indices of fluoride films in the VUV spectral region.
AB - Depending on the choice of thin film models and measurement data used for the characterization analysis one can obtain essentially different characterization results. It is especially difficult to reliably determine refractive index wavelength dependencies in the case of low accuracy measurement data. We consider possible approaches aimed to improve a stability of refractive index determination. The ways of the verification of characterization results are also discussed. Practical examples used to illustrate the proposed approaches are connected with the most difficult case of the determination of the refractive indices of fluoride films in the VUV spectral region.
KW - Optical characterization
KW - Refractive index
KW - Thin films
UR - http://www.scopus.com/inward/record.url?scp=2342558634&partnerID=8YFLogxK
U2 - 10.1117/12.505554
DO - 10.1117/12.505554
M3 - Conference contribution
AN - SCOPUS:2342558634
SN - 0-8194-5061-8
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 331
EP - 342
BT - Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies
PB - SPIE
CY - Bellingham
T2 - Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies
Y2 - 3 August 2003 through 5 August 2003
ER -