Redistribution of supported vanadium oxide catalysts by pattern formation

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Authors

  • Florian Lovis
  • Martin Hesse
  • Ronald Imbihl
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Details

Original languageEnglish
Pages (from-to)171-176
Number of pages6
JournalCatalysis letters
Volume136
Issue number3-4
Publication statusPublished - 12 Mar 2010

Abstract

The behavior of ultra-thin (<1 ML) films of vanadium oxide on Rh(111) during the H2 + O2 reaction was studied in the 10 -6-10-4 mbar range with photoemission electron microscopy (PEEM). One observes that under reaction conditions the V-oxide condenses forming a stripe pattern of macroscopic dimensions on the surface. The pattern is characterized by an intrinsic wave length which obeys a power law dependence on the reactants pressure. The origin of the pattern is discussed within the concept of reactive phase separation, i.e. the strongly attractive interactions between V and O and/or changes in the interfacial energies caused by reduction are presumably the main driving forces for condensation.

Keywords

    H + O reaction, Photoelectron emission microscopy, Reactive phase separation, Rhodium, Stationary pattern, Vanadium oxide

ASJC Scopus subject areas

Cite this

Redistribution of supported vanadium oxide catalysts by pattern formation. / Lovis, Florian; Hesse, Martin; Imbihl, Ronald.
In: Catalysis letters, Vol. 136, No. 3-4, 12.03.2010, p. 171-176.

Research output: Contribution to journalArticleResearchpeer review

Lovis F, Hesse M, Imbihl R. Redistribution of supported vanadium oxide catalysts by pattern formation. Catalysis letters. 2010 Mar 12;136(3-4):171-176. doi: 10.1007/s10562-010-0320-5
Lovis, Florian ; Hesse, Martin ; Imbihl, Ronald. / Redistribution of supported vanadium oxide catalysts by pattern formation. In: Catalysis letters. 2010 ; Vol. 136, No. 3-4. pp. 171-176.
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