Recombination lifetimes in highly aluminum-doped silicon

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Original languageEnglish
Article number093707
JournalJournal of applied physics
Volume106
Issue number9
Early online date10 Nov 2009
Publication statusPublished - 2009
Externally publishedYes

Abstract

We show that the recombination lifetimes measured in highly aluminum-doped p -type silicon (Al- p+) regions, fabricated by means of screen printing and firing of aluminum paste, are three orders of magnitude larger than the lifetimes expected from the extrapolation of the lifetime data measured on aluminum-doped Czochralski-grown silicon wafers. Solar cell simulations demonstrate that the lifetime of 130 ns measured in Al- p+ regions with an aluminum doping concentration of ∼2× 1018 cm -3 enables solar cell open-circuit voltages of 670 mV and energy conversion efficiencies of 21% on n -type silicon wafers. These results prove that the efficiency potential of screen-printed Al- p+ emitters for the application to rear-junction n -type silicon solar cells is much higher than traditionally assumed.

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Recombination lifetimes in highly aluminum-doped silicon. / Schmidt, Jan; Thiemann, Nils; Bock, Robert et al.
In: Journal of applied physics, Vol. 106, No. 9, 093707, 2009.

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Schmidt J, Thiemann N, Bock R, Brendel R. Recombination lifetimes in highly aluminum-doped silicon. Journal of applied physics. 2009;106(9):093707. Epub 2009 Nov 10. doi: 10.1063/1.3253742
Schmidt, Jan ; Thiemann, Nils ; Bock, Robert et al. / Recombination lifetimes in highly aluminum-doped silicon. In: Journal of applied physics. 2009 ; Vol. 106, No. 9.
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