Recombination at local aluminum-alloyed silicon solar cell base contacts by dynamic infrared lifetime mapping

Research output: Contribution to journalArticleResearchpeer review

Authors

  • Jens Müller
  • Karsten Bothe
  • Sebastian Gatz
  • Heiko Plagwitz
  • Gunnar Schubert
  • Rolf Brendel

Research Organisations

External Research Organisations

  • Institute for Solar Energy Research (ISFH)
  • Sunways AG
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Details

Original languageEnglish
Pages (from-to)337-342
Number of pages6
JournalEnergy Procedia
Volume8
Early online date12 Aug 2011
Publication statusPublished - 2011

Abstract

The application of local aluminum (Al)-alloyed contacts to the p-type base of silicon solar cells reduces minority charge carrier recombination due to the formation of a local back surface field (LBSF). We study the recombination properties and formation of base contacts, which are realized by local laser ablation of a dielectric stack (laser contact opening - LCO) and subsequent full area screen printing of Al paste. Based on charge carrier lifetime measurements using the camera-based and calibration-free dynamic infrared lifetime mapping (ILM) technique, we determine contact recombination velocities at the contacts as low as Scont = 65 cm/s on 200 Ωcm float-zone silicon (FZ-Si) and corresponding reverse saturation current densities of J0,cont = 900 fA/cm2 on 1.5 Ωcm FZ-Si. As a result we show that local contact geometries with point contact radii r > 100 μm and line contact widths a > 80 μm are appropriate for lowest contact recombination employing local Al alloyed contacts. Furthermore, complete and high quality laser ablation of the dielectric stack is necessary for the formation of a sufficiently thick LBSF.

Keywords

    Carrier lifetime, Laser ablation, Local back surface field, Silicon solar cells

ASJC Scopus subject areas

Cite this

Recombination at local aluminum-alloyed silicon solar cell base contacts by dynamic infrared lifetime mapping. / Müller, Jens; Bothe, Karsten; Gatz, Sebastian et al.
In: Energy Procedia, Vol. 8, 2011, p. 337-342.

Research output: Contribution to journalArticleResearchpeer review

Müller J, Bothe K, Gatz S, Plagwitz H, Schubert G, Brendel R. Recombination at local aluminum-alloyed silicon solar cell base contacts by dynamic infrared lifetime mapping. Energy Procedia. 2011;8:337-342. Epub 2011 Aug 12. doi: 10.1016/j.egypro.2011.06.146, 10.15488/1156
Müller, Jens ; Bothe, Karsten ; Gatz, Sebastian et al. / Recombination at local aluminum-alloyed silicon solar cell base contacts by dynamic infrared lifetime mapping. In: Energy Procedia. 2011 ; Vol. 8. pp. 337-342.
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AU - Gatz, Sebastian

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AU - Schubert, Gunnar

AU - Brendel, Rolf

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AB - The application of local aluminum (Al)-alloyed contacts to the p-type base of silicon solar cells reduces minority charge carrier recombination due to the formation of a local back surface field (LBSF). We study the recombination properties and formation of base contacts, which are realized by local laser ablation of a dielectric stack (laser contact opening - LCO) and subsequent full area screen printing of Al paste. Based on charge carrier lifetime measurements using the camera-based and calibration-free dynamic infrared lifetime mapping (ILM) technique, we determine contact recombination velocities at the contacts as low as Scont = 65 cm/s on 200 Ωcm float-zone silicon (FZ-Si) and corresponding reverse saturation current densities of J0,cont = 900 fA/cm2 on 1.5 Ωcm FZ-Si. As a result we show that local contact geometries with point contact radii r > 100 μm and line contact widths a > 80 μm are appropriate for lowest contact recombination employing local Al alloyed contacts. Furthermore, complete and high quality laser ablation of the dielectric stack is necessary for the formation of a sufficiently thick LBSF.

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