Details
Original language | English |
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Title of host publication | Advances in Optical Thin Films VIII |
Editors | Michel Lequime, Detlev Ristau |
Publisher | SPIE |
Number of pages | 7 |
ISBN (electronic) | 9781510673588 |
Publication status | Published - 24 Jun 2024 |
Event | Advances in Optical Thin Films VIII 2024 - Strasbourg, France Duration: 8 Apr 2024 → 11 Apr 2024 |
Publication series
Name | Proceedings of SPIE - The International Society for Optical Engineering |
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Volume | 13020 |
ISSN (Print) | 0277-786X |
ISSN (electronic) | 1996-756X |
Abstract
ISO standards are periodically reviewed to ensure their relevance to the best industry practices. Significant advancements have been observed in laser source development and related technologies over the last two decades. These advancements encompass new irradiation regimes, ranging from ultrashort pulses to kW-class continuous wave irradiation, with substantially increased peak- and average laser power levels. This new reality also necessitates the adaptation of pertinent laser damage testing standards. As high-power laser applications introduce optical elements with unique failure mechanisms and size constraints, there is a growing need for the introduction of alternative testing methods. In this paper, we provide a brief overview of recent standardization efforts undertaken by ISO TC 172 SC 9 WG 1 for the revision of the ISO 21254 series standards -”Lasers and laser-related equipment — Test methods for laser-induced damage threshold”. Specifically, w e d iscuss t he n eed f or t he extension of’classical’ damage criteria, the introduction of alternative test procedures, and possible improvements in interrogation methods and analysis. The overarching goal of this paper is to promote transparency in the standardization process and inspire discussion, ultimately leading to the enhancement of accuracy and reliability in laser damage testing.
Keywords
- 21254, ISO, Laser damage, laser-induced damage threshold, LIDT
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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- Apa
- Vancouver
- BibTeX
- RIS
Advances in Optical Thin Films VIII. ed. / Michel Lequime; Detlev Ristau. SPIE, 2024. 130200G (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 13020).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Recent Advancements in Standardization Effort for Laser-Induced Damage Threshold Testing
AU - Melninkaitis, Andrius
AU - Keršys, Martynas
AU - Smalakys, Linas
AU - Batavičiūte, Gintare
AU - Pupka, Egidijus
AU - Galinis, Justinas
AU - Jupé, Marco
AU - Engesser, Clara
AU - Lamaignère, Laurent
AU - Ristau, Detlev
N1 - Publisher Copyright: © 2024 SPIE.
PY - 2024/6/24
Y1 - 2024/6/24
N2 - ISO standards are periodically reviewed to ensure their relevance to the best industry practices. Significant advancements have been observed in laser source development and related technologies over the last two decades. These advancements encompass new irradiation regimes, ranging from ultrashort pulses to kW-class continuous wave irradiation, with substantially increased peak- and average laser power levels. This new reality also necessitates the adaptation of pertinent laser damage testing standards. As high-power laser applications introduce optical elements with unique failure mechanisms and size constraints, there is a growing need for the introduction of alternative testing methods. In this paper, we provide a brief overview of recent standardization efforts undertaken by ISO TC 172 SC 9 WG 1 for the revision of the ISO 21254 series standards -”Lasers and laser-related equipment — Test methods for laser-induced damage threshold”. Specifically, w e d iscuss t he n eed f or t he extension of’classical’ damage criteria, the introduction of alternative test procedures, and possible improvements in interrogation methods and analysis. The overarching goal of this paper is to promote transparency in the standardization process and inspire discussion, ultimately leading to the enhancement of accuracy and reliability in laser damage testing.
AB - ISO standards are periodically reviewed to ensure their relevance to the best industry practices. Significant advancements have been observed in laser source development and related technologies over the last two decades. These advancements encompass new irradiation regimes, ranging from ultrashort pulses to kW-class continuous wave irradiation, with substantially increased peak- and average laser power levels. This new reality also necessitates the adaptation of pertinent laser damage testing standards. As high-power laser applications introduce optical elements with unique failure mechanisms and size constraints, there is a growing need for the introduction of alternative testing methods. In this paper, we provide a brief overview of recent standardization efforts undertaken by ISO TC 172 SC 9 WG 1 for the revision of the ISO 21254 series standards -”Lasers and laser-related equipment — Test methods for laser-induced damage threshold”. Specifically, w e d iscuss t he n eed f or t he extension of’classical’ damage criteria, the introduction of alternative test procedures, and possible improvements in interrogation methods and analysis. The overarching goal of this paper is to promote transparency in the standardization process and inspire discussion, ultimately leading to the enhancement of accuracy and reliability in laser damage testing.
KW - 21254
KW - ISO
KW - Laser damage
KW - laser-induced damage threshold
KW - LIDT
UR - http://www.scopus.com/inward/record.url?scp=85200367765&partnerID=8YFLogxK
U2 - 10.1117/12.3023107
DO - 10.1117/12.3023107
M3 - Conference contribution
AN - SCOPUS:85200367765
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in Optical Thin Films VIII
A2 - Lequime, Michel
A2 - Ristau, Detlev
PB - SPIE
T2 - Advances in Optical Thin Films VIII 2024
Y2 - 8 April 2024 through 11 April 2024
ER -