Details
| Translated title of the contribution | Deep reactive ion etching of shadow masks for direct deposition of sensors with a new coating system |
|---|---|
| Original language | German |
| Title of host publication | MikroSystemTechnik Kongress 2017 |
| Subtitle of host publication | Proceedings |
| Place of Publication | Berlin |
| Publisher | VDE Verlag GmbH |
| Pages | 680-683 |
| Number of pages | 4 |
| ISBN (electronic) | 9783800744916 |
| Publication status | Published - 2017 |
| Event | MikroSystemTechnik Kongress 2017: MEMS, Mikroelektronik, Systeme - München, Germany Duration: 23 Oct 2017 → 25 Oct 2017 |
Abstract
Nowadays, technical systems are equipped with a variety of sensors [1]. To cope with the resulting new manufacturing requirements, a new coating technology has been invented at the Institute of Micro Production Technology [2,3]. Such technology enables a deposition of sensors directly on components of nearly arbitrary size. So far, laser-structured metall shadow masks have been used for structuring the sensor systems [4]. Within this paper, a method for manufacturing silicon shadow masks by means of deep reactive ion etching is presented. Challenges during the manufacturing process and suitable solutions are mentioned. Moreover, the structural quality of the shadow masks and of directly deposited sensor systems, structured with the shadow masks, are evaluated.
ASJC Scopus subject areas
- Engineering(all)
- Electrical and Electronic Engineering
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Materials Science(all)
- Surfaces, Coatings and Films
- Physics and Astronomy(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Atomic and Molecular Physics, and Optics
Cite this
- Standard
- Harvard
- Apa
- Vancouver
- BibTeX
- RIS
MikroSystemTechnik Kongress 2017: Proceedings. Berlin: VDE Verlag GmbH, 2017. p. 680-683.
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research
}
TY - GEN
T1 - Reaktives Ionentiefenätzen von Schattenmasken für die Sensordirektabscheidung mit einer neuartigen Beschichtungsanlage
AU - Klaas, Daniel
AU - Pehrs, Florian
AU - Wurz, Marc Christopher
PY - 2017
Y1 - 2017
N2 - Nowadays, technical systems are equipped with a variety of sensors [1]. To cope with the resulting new manufacturing requirements, a new coating technology has been invented at the Institute of Micro Production Technology [2,3]. Such technology enables a deposition of sensors directly on components of nearly arbitrary size. So far, laser-structured metall shadow masks have been used for structuring the sensor systems [4]. Within this paper, a method for manufacturing silicon shadow masks by means of deep reactive ion etching is presented. Challenges during the manufacturing process and suitable solutions are mentioned. Moreover, the structural quality of the shadow masks and of directly deposited sensor systems, structured with the shadow masks, are evaluated.
AB - Nowadays, technical systems are equipped with a variety of sensors [1]. To cope with the resulting new manufacturing requirements, a new coating technology has been invented at the Institute of Micro Production Technology [2,3]. Such technology enables a deposition of sensors directly on components of nearly arbitrary size. So far, laser-structured metall shadow masks have been used for structuring the sensor systems [4]. Within this paper, a method for manufacturing silicon shadow masks by means of deep reactive ion etching is presented. Challenges during the manufacturing process and suitable solutions are mentioned. Moreover, the structural quality of the shadow masks and of directly deposited sensor systems, structured with the shadow masks, are evaluated.
UR - http://www.scopus.com/inward/record.url?scp=85086411759&partnerID=8YFLogxK
M3 - Aufsatz in Konferenzband
SP - 680
EP - 683
BT - MikroSystemTechnik Kongress 2017
PB - VDE Verlag GmbH
CY - Berlin
T2 - MikroSystemTechnik Kongress 2017: MEMS, Mikroelektronik, Systeme
Y2 - 23 October 2017 through 25 October 2017
ER -