Details
| Original language | English |
|---|---|
| Pages (from-to) | 3690-3696 |
| Number of pages | 7 |
| Journal | Optics Express |
| Volume | 13 |
| Issue number | 10 |
| Publication status | Published - 15 May 2005 |
| Externally published | Yes |
Abstract
Precise dissection of cells with ultrashort laser pulses requires a clear understanding of how the onset and extent of ablation (i.e., the removal of material) depends on pulse energy. We carried out a systematic study of the energy dependence of the plasma-mediated ablation of fluorescently-labeled subcellular structures in the cytoskeleton and nuclei of fixed endothelial cells using femtosecond, near-infrared laser pulses focused through a high-numerical aperture objective lens (1.4 NA). We find that the energy threshold for photobleaching lies between 0.9 and 1.7 nJ. By comparing the changes in fluorescence with the actual material loss determined by electron microscopy, we find that the threshold for true material ablation is about 20% higher than the photobleaching threshold. This information makes it possible to use the fluorescence to determine the onset of true material ablation without resorting to electron microscopy. We confirm the precision of this technique by severing a single microtubule without disrupting the neighboring microtubules, less than 1 μm away.
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Atomic and Molecular Physics, and Optics
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In: Optics Express, Vol. 13, No. 10, 15.05.2005, p. 3690-3696.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Pulse energy dependence of subcellular dissection by femtosecond laser pulses
AU - Heisterkamp, Alexander
AU - Maxwell, I. Z.
AU - Mazur, E.
AU - Underwood, J. M.
AU - Nickerson, J. A.
AU - Kumar, Sanjay
AU - Ingber, D. E.
PY - 2005/5/15
Y1 - 2005/5/15
N2 - Precise dissection of cells with ultrashort laser pulses requires a clear understanding of how the onset and extent of ablation (i.e., the removal of material) depends on pulse energy. We carried out a systematic study of the energy dependence of the plasma-mediated ablation of fluorescently-labeled subcellular structures in the cytoskeleton and nuclei of fixed endothelial cells using femtosecond, near-infrared laser pulses focused through a high-numerical aperture objective lens (1.4 NA). We find that the energy threshold for photobleaching lies between 0.9 and 1.7 nJ. By comparing the changes in fluorescence with the actual material loss determined by electron microscopy, we find that the threshold for true material ablation is about 20% higher than the photobleaching threshold. This information makes it possible to use the fluorescence to determine the onset of true material ablation without resorting to electron microscopy. We confirm the precision of this technique by severing a single microtubule without disrupting the neighboring microtubules, less than 1 μm away.
AB - Precise dissection of cells with ultrashort laser pulses requires a clear understanding of how the onset and extent of ablation (i.e., the removal of material) depends on pulse energy. We carried out a systematic study of the energy dependence of the plasma-mediated ablation of fluorescently-labeled subcellular structures in the cytoskeleton and nuclei of fixed endothelial cells using femtosecond, near-infrared laser pulses focused through a high-numerical aperture objective lens (1.4 NA). We find that the energy threshold for photobleaching lies between 0.9 and 1.7 nJ. By comparing the changes in fluorescence with the actual material loss determined by electron microscopy, we find that the threshold for true material ablation is about 20% higher than the photobleaching threshold. This information makes it possible to use the fluorescence to determine the onset of true material ablation without resorting to electron microscopy. We confirm the precision of this technique by severing a single microtubule without disrupting the neighboring microtubules, less than 1 μm away.
UR - http://www.scopus.com/inward/record.url?scp=21244478590&partnerID=8YFLogxK
U2 - 10.1364/OPEX.13.003690
DO - 10.1364/OPEX.13.003690
M3 - Article
C2 - 16035172
AN - SCOPUS:21244478590
VL - 13
SP - 3690
EP - 3696
JO - Optics Express
JF - Optics Express
SN - 1094-4087
IS - 10
ER -