Details
| Original language | English |
|---|---|
| Title of host publication | Laser-Induced Damage in Optical Materials: 1999 |
| Subtitle of host publication | 4 - 7 October 1999, Boulder, Colorado ; proceedings |
| Place of Publication | Bellingham |
| Publisher | SPIE |
| Pages | 250-258 |
| Number of pages | 9 |
| ISBN (print) | 0-8194-3508-2 |
| Publication status | Published - 3 Mar 2000 |
| Externally published | Yes |
| Event | 31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999' - Boulder, CO, USA Duration: 4 Oct 1999 → 7 Oct 1999 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Publisher | SPIE |
| Volume | 3902 |
| ISSN (Print) | 0277-786X |
Abstract
The key technologies for modern production processes with enhanced spatial resolution, require high performance DUV-excimer laser optics with enhanced optical properties. Major challenges imposed onto the requested new generation of optical elements are concentrated on lowest absorption and scattering as well as stability against highest pulse number throughput. These targets are the driving force within the German Joint Research Project `OPUS II', which is dedicated to the development of high quality optical components for the DUV spectral range. As a major contribution to these investigations, sets of reflecting stacks with four different numbers of layer pairs of LaF3/MgF2 were produced by 6 partners of the consortium and characterized in respect to their optical performance and structural properties. The characterization includes spectrophotometric measurements from the VUV up to the mid infrared range, calorimetric absorption measurements at 193 nm, and a comparative study in total scatter behavior at 193 nm, which was performed by three laboratories within the project. Also, besides the intrinsic stress and the surface topography of the layers, the non-linear absorption behavior of selected samples have been determined. The results are presented and discussed with respect to possible applications.
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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Laser-Induced Damage in Optical Materials: 1999: 4 - 7 October 1999, Boulder, Colorado ; proceedings. Bellingham: SPIE, 2000. p. 250-258 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 3902).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Properties of fluoride DUV-excimer laser optics
T2 - 31st Annual Boulder Damage Symposium: 'Laser-Induced Damage in Optical Materials 1999'
AU - Arens, Winfried
AU - Ristau, Detlev
AU - Ullmann, Jens
AU - Zaczek, Christoph
AU - Thielsch, Roland
AU - Kaiser, Norbert
AU - Duparre, Angela
AU - Apel, Oliver
AU - Mann, Klaus
AU - Lauth, Hans
AU - Bernitzki, Helmut
AU - Schippel, Stefan
AU - Heyer, H.
AU - Ebert, Johanes
PY - 2000/3/3
Y1 - 2000/3/3
N2 - The key technologies for modern production processes with enhanced spatial resolution, require high performance DUV-excimer laser optics with enhanced optical properties. Major challenges imposed onto the requested new generation of optical elements are concentrated on lowest absorption and scattering as well as stability against highest pulse number throughput. These targets are the driving force within the German Joint Research Project `OPUS II', which is dedicated to the development of high quality optical components for the DUV spectral range. As a major contribution to these investigations, sets of reflecting stacks with four different numbers of layer pairs of LaF3/MgF2 were produced by 6 partners of the consortium and characterized in respect to their optical performance and structural properties. The characterization includes spectrophotometric measurements from the VUV up to the mid infrared range, calorimetric absorption measurements at 193 nm, and a comparative study in total scatter behavior at 193 nm, which was performed by three laboratories within the project. Also, besides the intrinsic stress and the surface topography of the layers, the non-linear absorption behavior of selected samples have been determined. The results are presented and discussed with respect to possible applications.
AB - The key technologies for modern production processes with enhanced spatial resolution, require high performance DUV-excimer laser optics with enhanced optical properties. Major challenges imposed onto the requested new generation of optical elements are concentrated on lowest absorption and scattering as well as stability against highest pulse number throughput. These targets are the driving force within the German Joint Research Project `OPUS II', which is dedicated to the development of high quality optical components for the DUV spectral range. As a major contribution to these investigations, sets of reflecting stacks with four different numbers of layer pairs of LaF3/MgF2 were produced by 6 partners of the consortium and characterized in respect to their optical performance and structural properties. The characterization includes spectrophotometric measurements from the VUV up to the mid infrared range, calorimetric absorption measurements at 193 nm, and a comparative study in total scatter behavior at 193 nm, which was performed by three laboratories within the project. Also, besides the intrinsic stress and the surface topography of the layers, the non-linear absorption behavior of selected samples have been determined. The results are presented and discussed with respect to possible applications.
UR - http://www.scopus.com/inward/record.url?scp=0033872188&partnerID=8YFLogxK
U2 - 10.1117/12.379314
DO - 10.1117/12.379314
M3 - Conference contribution
AN - SCOPUS:0033872188
SN - 0-8194-3508-2
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 250
EP - 258
BT - Laser-Induced Damage in Optical Materials: 1999
PB - SPIE
CY - Bellingham
Y2 - 4 October 1999 through 7 October 1999
ER -