Details
Original language | English |
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Title of host publication | Symposium N |
Subtitle of host publication | Carbon, Hydrogen, Nitrogen, and Oxygen in Silicon and in Other Elemental Semiconductors |
Pages | [d]294p |
Edition | 1-3 |
Publication status | Published - Jan 1996 |
Externally published | Yes |
Publication series
Name | Materials science & engineering. B, Solid-state materials for advanced technology |
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Number | 1-3 |
Volume | B36 |
ISSN (Print) | 0921-5107 |
Abstract
The growth and properties of Si1-yCy and Si1-x-yGexCy alloys pseudomorphically strained on Si(001) will be reviewed. Although the bulk solubility of carbon in silicon is small, epitaxial layers of more than 1 at.%C can be fabricated. Most of the incorporated C atoms occupy substitutional positions and, therefore, allow strain manipulation; including the growth of an inversely strained Si1-x-yGexCy layer. The mechanical properties as well as the influence of C atoms on band structure will be discussed. Finally we will present an atomistic picture of a fully strain-compensated SiGeC layer.
ASJC Scopus subject areas
- Materials Science(all)
- General Materials Science
- Physics and Astronomy(all)
- Condensed Matter Physics
- Engineering(all)
- Mechanics of Materials
- Engineering(all)
- Mechanical Engineering
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Symposium N: Carbon, Hydrogen, Nitrogen, and Oxygen in Silicon and in Other Elemental Semiconductors. 1-3. ed. 1996. p. [d]294p (Materials science & engineering. B, Solid-state materials for advanced technology; Vol. B36, No. 1-3).
Research output: Chapter in book/report/conference proceeding › Contribution to book/anthology › Research › peer review
}
TY - CHAP
T1 - Proceedings of the 1995 E-MRS Spring Meeting
AU - Osten, H. J.
PY - 1996/1
Y1 - 1996/1
N2 - The growth and properties of Si1-yCy and Si1-x-yGexCy alloys pseudomorphically strained on Si(001) will be reviewed. Although the bulk solubility of carbon in silicon is small, epitaxial layers of more than 1 at.%C can be fabricated. Most of the incorporated C atoms occupy substitutional positions and, therefore, allow strain manipulation; including the growth of an inversely strained Si1-x-yGexCy layer. The mechanical properties as well as the influence of C atoms on band structure will be discussed. Finally we will present an atomistic picture of a fully strain-compensated SiGeC layer.
AB - The growth and properties of Si1-yCy and Si1-x-yGexCy alloys pseudomorphically strained on Si(001) will be reviewed. Although the bulk solubility of carbon in silicon is small, epitaxial layers of more than 1 at.%C can be fabricated. Most of the incorporated C atoms occupy substitutional positions and, therefore, allow strain manipulation; including the growth of an inversely strained Si1-x-yGexCy layer. The mechanical properties as well as the influence of C atoms on band structure will be discussed. Finally we will present an atomistic picture of a fully strain-compensated SiGeC layer.
UR - http://www.scopus.com/inward/record.url?scp=0029735099&partnerID=8YFLogxK
M3 - Contribution to book/anthology
AN - SCOPUS:0029735099
T3 - Materials science & engineering. B, Solid-state materials for advanced technology
SP - [d]294p
BT - Symposium N
ER -