Details
Original language | English |
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Title of host publication | Optical Systems Design 2015 |
Subtitle of host publication | Advances in Optical Thin Films V |
Publisher | SPIE |
ISBN (electronic) | 9781628418163 |
Publication status | Published - 23 Sept 2015 |
Event | Optical Systems Design 2015: Advances in Optical Thin Films V - Jena, Germany Duration: 7 Sept 2015 → 10 Sept 2015 |
Publication series
Name | Proceedings of SPIE - The International Society for Optical Engineering |
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Volume | 9627 |
ISSN (Print) | 0277-786X |
ISSN (electronic) | 1996-756X |
Abstract
In the present study the preparation and characterization of Al2O3/AlF3 material mixture coatings is described. The main focus is on the correlation between the optical properties (refractive index, extinction coefficient), elemental composition and mechanical properties, depending on deposition conditions. The thin mixture films prepared with E-Beam gun evaporation with and without plasma ion assistance show a continuous change in the refractive index between the basic materials extrema (n=1.4 - 1.75), depending on the constituents volume filling factors. At the same time, extinction coefficients vary between less than 1x10-4 and 2x10-3. In addition, it can be shown that in dependency of the applied plasma ion assistance, the residual stress inside the mixture layers is tunable. Finally, several multilayer coatings has been prepared and investigated.
Keywords
- AlO, AlF, Interference coatings, mechanical stress, mixture films, optical constants, optical thin films, plasma ion assisted deposition (PIAD)
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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- Apa
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- BibTeX
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Optical Systems Design 2015: Advances in Optical Thin Films V. SPIE, 2015. 96271N (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 9627).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Preparation and characterization of aluminum oxide/aluminum fluoride mixture coatings for applications in the deep ultraviolet spectral range
AU - Ristau, Detlev
AU - Franke, Christian
AU - Stenzel, Olaf
AU - Wilbrandt, Steffen
AU - Kaiser, Norbert
AU - Tünnermann, Andreas
PY - 2015/9/23
Y1 - 2015/9/23
N2 - In the present study the preparation and characterization of Al2O3/AlF3 material mixture coatings is described. The main focus is on the correlation between the optical properties (refractive index, extinction coefficient), elemental composition and mechanical properties, depending on deposition conditions. The thin mixture films prepared with E-Beam gun evaporation with and without plasma ion assistance show a continuous change in the refractive index between the basic materials extrema (n=1.4 - 1.75), depending on the constituents volume filling factors. At the same time, extinction coefficients vary between less than 1x10-4 and 2x10-3. In addition, it can be shown that in dependency of the applied plasma ion assistance, the residual stress inside the mixture layers is tunable. Finally, several multilayer coatings has been prepared and investigated.
AB - In the present study the preparation and characterization of Al2O3/AlF3 material mixture coatings is described. The main focus is on the correlation between the optical properties (refractive index, extinction coefficient), elemental composition and mechanical properties, depending on deposition conditions. The thin mixture films prepared with E-Beam gun evaporation with and without plasma ion assistance show a continuous change in the refractive index between the basic materials extrema (n=1.4 - 1.75), depending on the constituents volume filling factors. At the same time, extinction coefficients vary between less than 1x10-4 and 2x10-3. In addition, it can be shown that in dependency of the applied plasma ion assistance, the residual stress inside the mixture layers is tunable. Finally, several multilayer coatings has been prepared and investigated.
KW - AlO
KW - AlF
KW - Interference coatings
KW - mechanical stress
KW - mixture films
KW - optical constants
KW - optical thin films
KW - plasma ion assisted deposition (PIAD)
UR - http://www.scopus.com/inward/record.url?scp=84960922131&partnerID=8YFLogxK
U2 - 10.1117/12.2191282
DO - 10.1117/12.2191282
M3 - Conference contribution
AN - SCOPUS:84960922131
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Optical Systems Design 2015
PB - SPIE
T2 - Optical Systems Design 2015: Advances in Optical Thin Films V
Y2 - 7 September 2015 through 10 September 2015
ER -