Details
| Original language | English |
|---|---|
| Title of host publication | Laser-Induced Damage in Optical Materials: 2000 |
| Subtitle of host publication | proceedings |
| Place of Publication | Bellingham |
| Publisher | SPIE |
| Pages | 35-44 |
| Number of pages | 10 |
| ISBN (print) | 0-8194-4036-1 |
| Publication status | Published - 12 Apr 2001 |
| Externally published | Yes |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Publisher | SPIE |
| Volume | 4347 |
| ISSN (Print) | 0277-786X |
Abstract
Laser induced breakdown of a high-quality mirror consisting of alternating λ/4 layers of Ta2O5 and SiO2 and a single 500 nm thin film of Ta2O5 were studied with amplified and unamplified femtosecond pulses. The experimental data can be fitted with a model taking into account multiphoton absorption, impact ionization, and local intensity enhancements due to interference effects in the films. The results indicate that state of the art, high-quality thin films show a damage behavior that is similar to bulk materials. Defects and impurities play a negligible role. Incubation effects are found to reduce the damage threshold when the coatings are damaged with multiple pulses from a femtosecond oscillator. Time-resolved pump-probe reflection and transmission experiments indicate a decay of the excited electron plasma with characteristic time constants of 4 ps, 60 ps, and 700 ps.
Keywords
- Avalanche ionization, Femtosecond, Laser pulse induced dielectric breakdown, Multiphoton ionization, Plasma dynamics, Thin films
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
- Standard
- Harvard
- Apa
- Vancouver
- BibTeX
- RIS
Laser-Induced Damage in Optical Materials: 2000: proceedings. Bellingham: SPIE, 2001. p. 35-44 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 4347).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Physical mechanisms of femtosecond pulse induced damage in dielectric thin-films
AU - Jasapara, Jayesh C.
AU - Nampoothiri, A. V. Vasudevan
AU - Rudolph, Wolfgang G.
AU - Ristau, Detlev
AU - Starke, Kai
PY - 2001/4/12
Y1 - 2001/4/12
N2 - Laser induced breakdown of a high-quality mirror consisting of alternating λ/4 layers of Ta2O5 and SiO2 and a single 500 nm thin film of Ta2O5 were studied with amplified and unamplified femtosecond pulses. The experimental data can be fitted with a model taking into account multiphoton absorption, impact ionization, and local intensity enhancements due to interference effects in the films. The results indicate that state of the art, high-quality thin films show a damage behavior that is similar to bulk materials. Defects and impurities play a negligible role. Incubation effects are found to reduce the damage threshold when the coatings are damaged with multiple pulses from a femtosecond oscillator. Time-resolved pump-probe reflection and transmission experiments indicate a decay of the excited electron plasma with characteristic time constants of 4 ps, 60 ps, and 700 ps.
AB - Laser induced breakdown of a high-quality mirror consisting of alternating λ/4 layers of Ta2O5 and SiO2 and a single 500 nm thin film of Ta2O5 were studied with amplified and unamplified femtosecond pulses. The experimental data can be fitted with a model taking into account multiphoton absorption, impact ionization, and local intensity enhancements due to interference effects in the films. The results indicate that state of the art, high-quality thin films show a damage behavior that is similar to bulk materials. Defects and impurities play a negligible role. Incubation effects are found to reduce the damage threshold when the coatings are damaged with multiple pulses from a femtosecond oscillator. Time-resolved pump-probe reflection and transmission experiments indicate a decay of the excited electron plasma with characteristic time constants of 4 ps, 60 ps, and 700 ps.
KW - Avalanche ionization
KW - Femtosecond
KW - Laser pulse induced dielectric breakdown
KW - Multiphoton ionization
KW - Plasma dynamics
KW - Thin films
UR - http://www.scopus.com/inward/record.url?scp=0034853682&partnerID=8YFLogxK
U2 - 10.1117/12.425032
DO - 10.1117/12.425032
M3 - Conference contribution
AN - SCOPUS:0034853682
SN - 0-8194-4036-1
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 35
EP - 44
BT - Laser-Induced Damage in Optical Materials: 2000
PB - SPIE
CY - Bellingham
ER -