Details
| Original language | English |
|---|---|
| Pages (from-to) | 7239-7253 |
| Number of pages | 15 |
| Journal | Applied Optics |
| Volume | 34 |
| Issue number | 31 |
| Publication status | Published - Nov 1995 |
| Externally published | Yes |
Abstract
An overview of the application of the photothermal technique for optical as well as thermophysical characterizations of thin films is given. The peculiarities of this technique are discussed in some detail, and selected important results are pointed out. Emphasis is placed on the influence of both residual absorption and randomly distributed inhomogeneities in thin films on their laser-damage resistance.
Keywords
- Bulk absorption, Elastic thin-film properties, Interface absorption, Laser radiation resistivity, Optical, Optical thin films, Photothermal technique, Surface absorption, Thermal
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Atomic and Molecular Physics, and Optics
- Engineering(all)
- Engineering (miscellaneous)
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
- Standard
- Harvard
- Apa
- Vancouver
- BibTeX
- RIS
In: Applied Optics, Vol. 34, No. 31, 11.1995, p. 7239-7253.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Photothermal measurements on optical thin films
AU - Welsch, Eberhard
AU - Ristau, Detlev
PY - 1995/11
Y1 - 1995/11
N2 - An overview of the application of the photothermal technique for optical as well as thermophysical characterizations of thin films is given. The peculiarities of this technique are discussed in some detail, and selected important results are pointed out. Emphasis is placed on the influence of both residual absorption and randomly distributed inhomogeneities in thin films on their laser-damage resistance.
AB - An overview of the application of the photothermal technique for optical as well as thermophysical characterizations of thin films is given. The peculiarities of this technique are discussed in some detail, and selected important results are pointed out. Emphasis is placed on the influence of both residual absorption and randomly distributed inhomogeneities in thin films on their laser-damage resistance.
KW - Bulk absorption
KW - Elastic thin-film properties
KW - Interface absorption
KW - Laser radiation resistivity
KW - Optical
KW - Optical thin films
KW - Photothermal technique
KW - Surface absorption
KW - Thermal
UR - http://www.scopus.com/inward/record.url?scp=0001398662&partnerID=8YFLogxK
U2 - 10.1364/AO.34.007239
DO - 10.1364/AO.34.007239
M3 - Article
AN - SCOPUS:0001398662
VL - 34
SP - 7239
EP - 7253
JO - Applied Optics
JF - Applied Optics
SN - 1559-128X
IS - 31
ER -