Details
| Original language | English |
|---|---|
| Article number | 022208 |
| Journal | Journal of Laser Applications |
| Volume | 28 |
| Issue number | 2 |
| Publication status | Published - 31 May 2016 |
| Externally published | Yes |
Abstract
Ablation of thin metal films with laser pulses having a pulse duration shorter than the electron-phonon relaxation time, so called ultrashort laser pulses, enables melt-free patterning of arbitrary geometries. Ablation with ultrashort laser pulses is an emerging process and is currently used in the field of microelectronics for the repair of photolithography masks and in the photovoltaic industry for patterning of indium tin oxide (ITO). Another current field of investigation is the patterning of thin film strain sensors. In order to achieve the desired ablation quality, a multipulse irradiation is often required. Currently, there is no "simple" model to predict line and more complex ablation geometries created by multipulse irradiation. Within this paper, an incubation threshold is introduced to enhance an existing incubation model, which is restricted to the prediction of point ablations. The resulting phenomenological model is experimentally verified on thin NiCr films using 10 ps laser pulses. The usability of the derived model is significantly higher than other existing models due to concentrating on the relevant criterion for patterning of electronic circuits: the removal threshold as well as an easy to handle procedure to determine the model parameters, which can be determined on a machining setup in industrial conditions.
Keywords
- Incubation model, Thin film patterning, Ultra short pulse laser ablation
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Atomic and Molecular Physics, and Optics
- Engineering(all)
- Biomedical Engineering
- Physics and Astronomy(all)
- Instrumentation
Sustainable Development Goals
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In: Journal of Laser Applications, Vol. 28, No. 2, 022208, 31.05.2016.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Phenomenological model for prediction of complex ablation geometries in metal films using ultrashort laser pulses
AU - Suttmann, Oliver
AU - Duesing, Jan
AU - Overmeyer, Ludger
PY - 2016/5/31
Y1 - 2016/5/31
N2 - Ablation of thin metal films with laser pulses having a pulse duration shorter than the electron-phonon relaxation time, so called ultrashort laser pulses, enables melt-free patterning of arbitrary geometries. Ablation with ultrashort laser pulses is an emerging process and is currently used in the field of microelectronics for the repair of photolithography masks and in the photovoltaic industry for patterning of indium tin oxide (ITO). Another current field of investigation is the patterning of thin film strain sensors. In order to achieve the desired ablation quality, a multipulse irradiation is often required. Currently, there is no "simple" model to predict line and more complex ablation geometries created by multipulse irradiation. Within this paper, an incubation threshold is introduced to enhance an existing incubation model, which is restricted to the prediction of point ablations. The resulting phenomenological model is experimentally verified on thin NiCr films using 10 ps laser pulses. The usability of the derived model is significantly higher than other existing models due to concentrating on the relevant criterion for patterning of electronic circuits: the removal threshold as well as an easy to handle procedure to determine the model parameters, which can be determined on a machining setup in industrial conditions.
AB - Ablation of thin metal films with laser pulses having a pulse duration shorter than the electron-phonon relaxation time, so called ultrashort laser pulses, enables melt-free patterning of arbitrary geometries. Ablation with ultrashort laser pulses is an emerging process and is currently used in the field of microelectronics for the repair of photolithography masks and in the photovoltaic industry for patterning of indium tin oxide (ITO). Another current field of investigation is the patterning of thin film strain sensors. In order to achieve the desired ablation quality, a multipulse irradiation is often required. Currently, there is no "simple" model to predict line and more complex ablation geometries created by multipulse irradiation. Within this paper, an incubation threshold is introduced to enhance an existing incubation model, which is restricted to the prediction of point ablations. The resulting phenomenological model is experimentally verified on thin NiCr films using 10 ps laser pulses. The usability of the derived model is significantly higher than other existing models due to concentrating on the relevant criterion for patterning of electronic circuits: the removal threshold as well as an easy to handle procedure to determine the model parameters, which can be determined on a machining setup in industrial conditions.
KW - Incubation model
KW - Thin film patterning
KW - Ultra short pulse laser ablation
UR - http://www.scopus.com/inward/record.url?scp=84963525457&partnerID=8YFLogxK
U2 - 10.2351/1.4944507
DO - 10.2351/1.4944507
M3 - Article
AN - SCOPUS:84963525457
VL - 28
JO - Journal of Laser Applications
JF - Journal of Laser Applications
SN - 1042-346X
IS - 2
M1 - 022208
ER -