Phenomenological model for prediction of complex ablation geometries in metal films using ultrashort laser pulses

Research output: Contribution to journalArticleResearchpeer review

Authors

  • Oliver Suttmann
  • Jan Duesing
  • Ludger Overmeyer

External Research Organisations

  • Laser Zentrum Hannover e.V. (LZH)
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Details

Original languageEnglish
Article number022208
JournalJournal of Laser Applications
Volume28
Issue number2
Publication statusPublished - 31 May 2016
Externally publishedYes

Abstract

Ablation of thin metal films with laser pulses having a pulse duration shorter than the electron-phonon relaxation time, so called ultrashort laser pulses, enables melt-free patterning of arbitrary geometries. Ablation with ultrashort laser pulses is an emerging process and is currently used in the field of microelectronics for the repair of photolithography masks and in the photovoltaic industry for patterning of indium tin oxide (ITO). Another current field of investigation is the patterning of thin film strain sensors. In order to achieve the desired ablation quality, a multipulse irradiation is often required. Currently, there is no "simple" model to predict line and more complex ablation geometries created by multipulse irradiation. Within this paper, an incubation threshold is introduced to enhance an existing incubation model, which is restricted to the prediction of point ablations. The resulting phenomenological model is experimentally verified on thin NiCr films using 10 ps laser pulses. The usability of the derived model is significantly higher than other existing models due to concentrating on the relevant criterion for patterning of electronic circuits: the removal threshold as well as an easy to handle procedure to determine the model parameters, which can be determined on a machining setup in industrial conditions.

Keywords

    Incubation model, Thin film patterning, Ultra short pulse laser ablation

ASJC Scopus subject areas

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Phenomenological model for prediction of complex ablation geometries in metal films using ultrashort laser pulses. / Suttmann, Oliver; Duesing, Jan; Overmeyer, Ludger.
In: Journal of Laser Applications, Vol. 28, No. 2, 022208, 31.05.2016.

Research output: Contribution to journalArticleResearchpeer review

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