Patterning microfluidic device wettability using flow confinement

Research output: Contribution to journalArticleResearchpeer review

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External Research Organisations

  • Harvard University
  • Universität Hamburg
  • Freie Universität Berlin (FU Berlin)
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Details

Original languageEnglish
Pages (from-to)1774-1776
Number of pages3
JournalLab on a Chip
Volume10
Issue number14
Publication statusPublished - 21 May 2010
Externally publishedYes

Abstract

We present a simple method to spatially pattern the surface properties of microfluidic devices using flow confinement. Our technique allows surface patterning with micron-scale resolution. To demonstrate its effectiveness, we use it to pattern wettability to form W/O/W and O/W/O double emulsions.

ASJC Scopus subject areas

Cite this

Patterning microfluidic device wettability using flow confinement. / Abate, Adam R.; Thiele, Julian; Weinhart, Marie et al.
In: Lab on a Chip, Vol. 10, No. 14, 21.05.2010, p. 1774-1776.

Research output: Contribution to journalArticleResearchpeer review

Abate AR, Thiele J, Weinhart M, Weitz DA. Patterning microfluidic device wettability using flow confinement. Lab on a Chip. 2010 May 21;10(14):1774-1776. doi: 10.1039/c004124f
Abate, Adam R. ; Thiele, Julian ; Weinhart, Marie et al. / Patterning microfluidic device wettability using flow confinement. In: Lab on a Chip. 2010 ; Vol. 10, No. 14. pp. 1774-1776.
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