Optimization of Epitaxial Graphene Growth for Quantum Metrology

Research output: ThesisDoctoral thesis

Authors

  • Davood Momeni Pakdehi
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Details

Original languageEnglish
QualificationDoctor rerum naturalium
Awarding Institution
Supervised by
  • Schumacher, Hans W., Supervisor, External person
Date of Award11 Sept 2020
Place of PublicationHannover
Publication statusPublished - 2020

Abstract

The electrical quantum standards have played a decisive role in modern metrology, particularly since the introduction of the revised International System of Units (SI) in May 2019. By adapting the basic units to exactly defined natural constants, the quantized Hall resistance (QHR) standards are also given precisely. The Von Klitzing constant RK = h/e2 (h Planck's constant and e elementary charge) can be measured precisely using the quantum Hall effect (QHE) and is thus the primary representation of the ohm. Currently, the QHR standard based on GaAs/AlGaAs heterostructure has succeeded in yielding robust resistance measurements with high accuracy

Cite this

Optimization of Epitaxial Graphene Growth for Quantum Metrology. / Momeni Pakdehi, Davood.
Hannover, 2020. 213 p.

Research output: ThesisDoctoral thesis

Momeni Pakdehi, D 2020, 'Optimization of Epitaxial Graphene Growth for Quantum Metrology', Doctor rerum naturalium, Leibniz University Hannover, Hannover. https://doi.org/10.15488/10201
Momeni Pakdehi, D. (2020). Optimization of Epitaxial Graphene Growth for Quantum Metrology. [Doctoral thesis, Leibniz University Hannover]. https://doi.org/10.15488/10201
Momeni Pakdehi D. Optimization of Epitaxial Graphene Growth for Quantum Metrology. Hannover, 2020. 213 p. doi: 10.15488/10201
Momeni Pakdehi, Davood. / Optimization of Epitaxial Graphene Growth for Quantum Metrology. Hannover, 2020. 213 p.
Download
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