Details
| Original language | English |
|---|---|
| Title of host publication | Metrology, Inspection, and Process Control for Microlithography XXII |
| Publication status | Published - 16 Apr 2008 |
| Externally published | Yes |
| Event | Metrology, Inspection, and Process Control for Microlithography XXII - San Jose, CA, United States Duration: 25 Feb 2008 → 28 Feb 2008 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 6922 |
| ISSN (Print) | 0277-786X |
Abstract
The development of a novel compact EUV spectrophotometer will be presented. The device is capable of measuring reflectance and transmittance spectra of medium scale EUV-optics primary in the spectral range from 12 nm to 21 nm. Based on a new polychromatic measurement principle, the system uses the direct irradiation of a table-top EUV-source for illuminating the sample and a broad-band spectrograph for detecting the probe and reference beam. Samples can be investigated under different angles of incidence and in respect of lateral dependencies. Typical results of reflectivity investigations of Mo/Si-mirrors and transmitting foils will be shown and compared with reference measurements of certified institutes and calculations.
Keywords
- Cathode ray tube, EUV, Fiat-field spectrograph, Laser plasma source, Multilayers, Refiectometry, Reflectance, Transmittance
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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Metrology, Inspection, and Process Control for Microlithography XXII. 2008. 692228 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6922).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Optics characterization with a compact EUV spectrophotometer
AU - Blasehke, H.
AU - Balasa, Istvan
AU - Koeh, L.
AU - Starke, Kai
AU - Ristau, Detlev
AU - Wies, Christian
AU - Lebert, Rainer
AU - Bayer, A.
AU - Barkusky, F.
AU - Mann, K.
PY - 2008/4/16
Y1 - 2008/4/16
N2 - The development of a novel compact EUV spectrophotometer will be presented. The device is capable of measuring reflectance and transmittance spectra of medium scale EUV-optics primary in the spectral range from 12 nm to 21 nm. Based on a new polychromatic measurement principle, the system uses the direct irradiation of a table-top EUV-source for illuminating the sample and a broad-band spectrograph for detecting the probe and reference beam. Samples can be investigated under different angles of incidence and in respect of lateral dependencies. Typical results of reflectivity investigations of Mo/Si-mirrors and transmitting foils will be shown and compared with reference measurements of certified institutes and calculations.
AB - The development of a novel compact EUV spectrophotometer will be presented. The device is capable of measuring reflectance and transmittance spectra of medium scale EUV-optics primary in the spectral range from 12 nm to 21 nm. Based on a new polychromatic measurement principle, the system uses the direct irradiation of a table-top EUV-source for illuminating the sample and a broad-band spectrograph for detecting the probe and reference beam. Samples can be investigated under different angles of incidence and in respect of lateral dependencies. Typical results of reflectivity investigations of Mo/Si-mirrors and transmitting foils will be shown and compared with reference measurements of certified institutes and calculations.
KW - Cathode ray tube
KW - EUV
KW - Fiat-field spectrograph
KW - Laser plasma source
KW - Multilayers
KW - Refiectometry
KW - Reflectance
KW - Transmittance
UR - http://www.scopus.com/inward/record.url?scp=79958787545&partnerID=8YFLogxK
U2 - 10.1117/12.772859
DO - 10.1117/12.772859
M3 - Conference contribution
AN - SCOPUS:79958787545
SN - 9780819471079
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Metrology, Inspection, and Process Control for Microlithography XXII
T2 - Metrology, Inspection, and Process Control for Microlithography XXII
Y2 - 25 February 2008 through 28 February 2008
ER -