Optical Quality Control for Adaptive Polishing Processes

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • Marc Kassubeck
  • Talash Malek
  • Moritz Muhlhausen
  • Moritz Kappel
  • Susana Castillo
  • Marc Andre Dittrich
  • Marcus Magnor

External Research Organisations

  • Technische Universität Braunschweig
  • University of New Mexico
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Details

Original languageEnglish
Title of host publication2020 IEEE Southwest Symposium on Image Analysis and Interpretation, SSIAI 2020 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages90-94
Number of pages5
ISBN (electronic)9781728157450
ISBN (print)978-1-7281-5744-3, 978-1-7281-5746-7
Publication statusPublished - 2020
Event2020 IEEE Southwest Symposium on Image Analysis and Interpretation, SSIAI 2020 - Santa Fe, United States
Duration: 29 Mar 202031 Mar 2020

Publication series

NameProceedings of the IEEE Southwest Symposium on Image Analysis and Interpretation
Volume2020-March

Abstract

We propose an image-based method to automatically estimate the surface roughness of a polishing process carried out by a numerically controlled machine tool. Given a single photograph of the workpiece, we incorporate techniques from differentiable rendering to infer the object's roughness parameters, resulting in several advantages over existing approaches: since the method fully accounts for global light transport effects, the estimation can occur under general, known lighting conditions and workpiece geometries. This allows deployment of our approach for in-situ measurements by simply equipping the machine tool with a standard digital camera capturing photos of the workpiece. We investigate the feasibility and effectiveness of our novel method in a prototype application considering polished brass plates. Our results demonstrate a promising direction for surface parameter measurement in less restricted polishing process environments.

Keywords

    Differentiable Rendering, Optical Measurement, Optimization, Polishing

ASJC Scopus subject areas

Cite this

Optical Quality Control for Adaptive Polishing Processes. / Kassubeck, Marc; Malek, Talash; Muhlhausen, Moritz et al.
2020 IEEE Southwest Symposium on Image Analysis and Interpretation, SSIAI 2020 - Proceedings. Institute of Electrical and Electronics Engineers Inc., 2020. p. 90-94 9094615 (Proceedings of the IEEE Southwest Symposium on Image Analysis and Interpretation; Vol. 2020-March).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Kassubeck, M, Malek, T, Muhlhausen, M, Kappel, M, Castillo, S, Dittrich, MA & Magnor, M 2020, Optical Quality Control for Adaptive Polishing Processes. in 2020 IEEE Southwest Symposium on Image Analysis and Interpretation, SSIAI 2020 - Proceedings., 9094615, Proceedings of the IEEE Southwest Symposium on Image Analysis and Interpretation, vol. 2020-March, Institute of Electrical and Electronics Engineers Inc., pp. 90-94, 2020 IEEE Southwest Symposium on Image Analysis and Interpretation, SSIAI 2020, Santa Fe, United States, 29 Mar 2020. https://doi.org/10.1109/ssiai49293.2020.9094615
Kassubeck, M., Malek, T., Muhlhausen, M., Kappel, M., Castillo, S., Dittrich, M. A., & Magnor, M. (2020). Optical Quality Control for Adaptive Polishing Processes. In 2020 IEEE Southwest Symposium on Image Analysis and Interpretation, SSIAI 2020 - Proceedings (pp. 90-94). Article 9094615 (Proceedings of the IEEE Southwest Symposium on Image Analysis and Interpretation; Vol. 2020-March). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ssiai49293.2020.9094615
Kassubeck M, Malek T, Muhlhausen M, Kappel M, Castillo S, Dittrich MA et al. Optical Quality Control for Adaptive Polishing Processes. In 2020 IEEE Southwest Symposium on Image Analysis and Interpretation, SSIAI 2020 - Proceedings. Institute of Electrical and Electronics Engineers Inc. 2020. p. 90-94. 9094615. (Proceedings of the IEEE Southwest Symposium on Image Analysis and Interpretation). doi: 10.1109/ssiai49293.2020.9094615
Kassubeck, Marc ; Malek, Talash ; Muhlhausen, Moritz et al. / Optical Quality Control for Adaptive Polishing Processes. 2020 IEEE Southwest Symposium on Image Analysis and Interpretation, SSIAI 2020 - Proceedings. Institute of Electrical and Electronics Engineers Inc., 2020. pp. 90-94 (Proceedings of the IEEE Southwest Symposium on Image Analysis and Interpretation).
Download
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abstract = "We propose an image-based method to automatically estimate the surface roughness of a polishing process carried out by a numerically controlled machine tool. Given a single photograph of the workpiece, we incorporate techniques from differentiable rendering to infer the object's roughness parameters, resulting in several advantages over existing approaches: since the method fully accounts for global light transport effects, the estimation can occur under general, known lighting conditions and workpiece geometries. This allows deployment of our approach for in-situ measurements by simply equipping the machine tool with a standard digital camera capturing photos of the workpiece. We investigate the feasibility and effectiveness of our novel method in a prototype application considering polished brass plates. Our results demonstrate a promising direction for surface parameter measurement in less restricted polishing process environments.",
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