On the equilibrium concentration of boron-oxygen defects in crystalline silicon

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Authors

  • Dominic C. Walter
  • Robert Falster
  • Vladimir V. Voronkov
  • Jan Schmidt

Research Organisations

External Research Organisations

  • Institute for Solar Energy Research (ISFH)
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Details

Original languageEnglish
Pages (from-to)33-36
Number of pages4
JournalSolar Energy Materials and Solar Cells
Volume173
Publication statusPublished - Dec 2017

Abstract

We determine the equilibrium concentration of the BO defect in boron-doped Czochralski-grown silicon after prolonged (up to 150 h) annealing at relatively low temperatures between 200 and 300 °C. We show that after sample processing, the BO concentration has not necessarily reached the equilibrium state. The actually reached state depends on the detailed temperature profile of the last temperature treatment before the light-induced degradation (LID) is performed. For the investigated Cz-Si materials with base resistivities ranging between 0.5 and 2.5 Ω cm, we observe that an annealing step at 200 °C for 50 h establishes the equilibrium, independent of the base resistivity. Experiments performed at different temperatures reveal that the equilibrium defect concentration decreases with increasing annealing temperature. This observation can be understood, assuming a mobile species which is distributed between at least two different sinks. A possible defect model is discussed.

Keywords

    Boron-oxygen defects, Carrier lifetime, Czochralski silicon

ASJC Scopus subject areas

Sustainable Development Goals

Cite this

On the equilibrium concentration of boron-oxygen defects in crystalline silicon. / Walter, Dominic C.; Falster, Robert; Voronkov, Vladimir V. et al.
In: Solar Energy Materials and Solar Cells, Vol. 173, 12.2017, p. 33-36.

Research output: Contribution to journalArticleResearchpeer review

Walter DC, Falster R, Voronkov VV, Schmidt J. On the equilibrium concentration of boron-oxygen defects in crystalline silicon. Solar Energy Materials and Solar Cells. 2017 Dec;173:33-36. doi: 10.1016/j.solmat.2017.06.036
Walter, Dominic C. ; Falster, Robert ; Voronkov, Vladimir V. et al. / On the equilibrium concentration of boron-oxygen defects in crystalline silicon. In: Solar Energy Materials and Solar Cells. 2017 ; Vol. 173. pp. 33-36.
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@article{1b32e2aeedc4419d8219f792620bc23c,
title = "On the equilibrium concentration of boron-oxygen defects in crystalline silicon",
abstract = "We determine the equilibrium concentration of the BO defect in boron-doped Czochralski-grown silicon after prolonged (up to 150 h) annealing at relatively low temperatures between 200 and 300 °C. We show that after sample processing, the BO concentration has not necessarily reached the equilibrium state. The actually reached state depends on the detailed temperature profile of the last temperature treatment before the light-induced degradation (LID) is performed. For the investigated Cz-Si materials with base resistivities ranging between 0.5 and 2.5 Ω cm, we observe that an annealing step at 200 °C for 50 h establishes the equilibrium, independent of the base resistivity. Experiments performed at different temperatures reveal that the equilibrium defect concentration decreases with increasing annealing temperature. This observation can be understood, assuming a mobile species which is distributed between at least two different sinks. A possible defect model is discussed.",
keywords = "Boron-oxygen defects, Carrier lifetime, Czochralski silicon",
author = "Walter, {Dominic C.} and Robert Falster and Voronkov, {Vladimir V.} and Jan Schmidt",
note = "Publisher Copyright: {\textcopyright} 2017 Elsevier B.V.",
year = "2017",
month = dec,
doi = "10.1016/j.solmat.2017.06.036",
language = "English",
volume = "173",
pages = "33--36",
journal = "Solar Energy Materials and Solar Cells",
issn = "0927-0248",
publisher = "Elsevier BV",

}

Download

TY - JOUR

T1 - On the equilibrium concentration of boron-oxygen defects in crystalline silicon

AU - Walter, Dominic C.

AU - Falster, Robert

AU - Voronkov, Vladimir V.

AU - Schmidt, Jan

N1 - Publisher Copyright: © 2017 Elsevier B.V.

PY - 2017/12

Y1 - 2017/12

N2 - We determine the equilibrium concentration of the BO defect in boron-doped Czochralski-grown silicon after prolonged (up to 150 h) annealing at relatively low temperatures between 200 and 300 °C. We show that after sample processing, the BO concentration has not necessarily reached the equilibrium state. The actually reached state depends on the detailed temperature profile of the last temperature treatment before the light-induced degradation (LID) is performed. For the investigated Cz-Si materials with base resistivities ranging between 0.5 and 2.5 Ω cm, we observe that an annealing step at 200 °C for 50 h establishes the equilibrium, independent of the base resistivity. Experiments performed at different temperatures reveal that the equilibrium defect concentration decreases with increasing annealing temperature. This observation can be understood, assuming a mobile species which is distributed between at least two different sinks. A possible defect model is discussed.

AB - We determine the equilibrium concentration of the BO defect in boron-doped Czochralski-grown silicon after prolonged (up to 150 h) annealing at relatively low temperatures between 200 and 300 °C. We show that after sample processing, the BO concentration has not necessarily reached the equilibrium state. The actually reached state depends on the detailed temperature profile of the last temperature treatment before the light-induced degradation (LID) is performed. For the investigated Cz-Si materials with base resistivities ranging between 0.5 and 2.5 Ω cm, we observe that an annealing step at 200 °C for 50 h establishes the equilibrium, independent of the base resistivity. Experiments performed at different temperatures reveal that the equilibrium defect concentration decreases with increasing annealing temperature. This observation can be understood, assuming a mobile species which is distributed between at least two different sinks. A possible defect model is discussed.

KW - Boron-oxygen defects

KW - Carrier lifetime

KW - Czochralski silicon

UR - http://www.scopus.com/inward/record.url?scp=85023762223&partnerID=8YFLogxK

U2 - 10.1016/j.solmat.2017.06.036

DO - 10.1016/j.solmat.2017.06.036

M3 - Article

VL - 173

SP - 33

EP - 36

JO - Solar Energy Materials and Solar Cells

JF - Solar Energy Materials and Solar Cells

SN - 0927-0248

ER -

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