Details
| Original language | English |
|---|---|
| Title of host publication | Laser-Induced Damage in Optical Materials: 2005 |
| Subtitle of host publication | 37th Annual Boulder Damage Symposium proceedings ; 19 - 21 September 2005, Boulder, Colorado |
| Place of Publication | Bellingham |
| Publisher | SPIE |
| ISBN (print) | 0-8194-6013-3 |
| Publication status | Published - 7 Feb 2006 |
| Externally published | Yes |
| Event | 37th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 2005 - Boulder, CO, United States Duration: 19 Sept 2005 → 21 Sept 2005 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Publisher | SPIE |
| Volume | 5991 |
| ISSN (Print) | 0277-786X |
Abstract
Nonlinear absorption measurements at 800 nm and 400 nm in single wavelength high reflection (HR) dielectric mirrors were performed, according to the ISO 11551 standard by pulse, gradient and exponential absorption evaluation methods, using pulsed, diode pumped femtosecond laser system with pulse duration ∼130 fs. Pulsed laser output at 1kHz repetition rate had 1 W and 0.36 W average power at 800 nm and 400 nm, respectively. The HR mirrors were made of ZrO2 and SiO2 layers. The beam was focused into the mirror, and changing the beam power by step attenuator, it was possible to evaluate nonlinear absorption at different intensities up to intensity close to damage threshold. The nonlinear absorptance for 400 nm pulses at the femtosecond pulse intensity 0.8 TW/cm2 was 0.48 % and ∼20 times exceeded the nonlinear absorptance for the 800 nm pulses.
Keywords
- HR dielectric mirrors, ISO 11551, Nonlinear absorption, Ultra-short pulses
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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Laser-Induced Damage in Optical Materials: 2005: 37th Annual Boulder Damage Symposium proceedings ; 19 - 21 September 2005, Boulder, Colorado. Bellingham: SPIE, 2006. (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 5991).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Nonlinear absorption of ultrashort pulses in HR dielectric mirrors
AU - Žukauskas, Andrius
AU - Melninkaitis, Andrius
AU - Sirutkaitis, Valdas
AU - Starke, Kai
AU - Ristau, Detlev
PY - 2006/2/7
Y1 - 2006/2/7
N2 - Nonlinear absorption measurements at 800 nm and 400 nm in single wavelength high reflection (HR) dielectric mirrors were performed, according to the ISO 11551 standard by pulse, gradient and exponential absorption evaluation methods, using pulsed, diode pumped femtosecond laser system with pulse duration ∼130 fs. Pulsed laser output at 1kHz repetition rate had 1 W and 0.36 W average power at 800 nm and 400 nm, respectively. The HR mirrors were made of ZrO2 and SiO2 layers. The beam was focused into the mirror, and changing the beam power by step attenuator, it was possible to evaluate nonlinear absorption at different intensities up to intensity close to damage threshold. The nonlinear absorptance for 400 nm pulses at the femtosecond pulse intensity 0.8 TW/cm2 was 0.48 % and ∼20 times exceeded the nonlinear absorptance for the 800 nm pulses.
AB - Nonlinear absorption measurements at 800 nm and 400 nm in single wavelength high reflection (HR) dielectric mirrors were performed, according to the ISO 11551 standard by pulse, gradient and exponential absorption evaluation methods, using pulsed, diode pumped femtosecond laser system with pulse duration ∼130 fs. Pulsed laser output at 1kHz repetition rate had 1 W and 0.36 W average power at 800 nm and 400 nm, respectively. The HR mirrors were made of ZrO2 and SiO2 layers. The beam was focused into the mirror, and changing the beam power by step attenuator, it was possible to evaluate nonlinear absorption at different intensities up to intensity close to damage threshold. The nonlinear absorptance for 400 nm pulses at the femtosecond pulse intensity 0.8 TW/cm2 was 0.48 % and ∼20 times exceeded the nonlinear absorptance for the 800 nm pulses.
KW - HR dielectric mirrors
KW - ISO 11551
KW - Nonlinear absorption
KW - Ultra-short pulses
UR - http://www.scopus.com/inward/record.url?scp=33644603238&partnerID=8YFLogxK
U2 - 10.1117/12.639032
DO - 10.1117/12.639032
M3 - Conference contribution
AN - SCOPUS:33644603238
SN - 0-8194-6013-3
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Laser-Induced Damage in Optical Materials: 2005
PB - SPIE
CY - Bellingham
T2 - 37th Annual Boulder Damage Symposium
Y2 - 19 September 2005 through 21 September 2005
ER -