'New automotive' - Considerations for reliability, robustness and resilience for CMOS interconnects

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

Research Organisations

External Research Organisations

  • Universite de Bordeaux
  • X-FAB Silicon Foundries SE
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Details

Original languageEnglish
Title of host publication2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1-6
Number of pages6
ISBN (electronic)9781944543044
Publication statusPublished - 15 Mar 2018
Event2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018 - Big Island, United States
Duration: 5 Feb 20188 Feb 2018

Publication series

Name2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018
Volume2018-January

Abstract

The technology evolution worsens the stress level of microelectronic applications. The shrinking, higher interconnect stacks, the diversity of functions, higher frequencies and power densities lead to higher stress and more interaction of effects. At package and assembly level the densification of internal interconnections, the combination of RF, digital, analog and power, new materials like lead free solder, more aggressive processes and 3D packages deliver new challenges for reliability performance. Requirements of harsh environment applications, the use of consumer products in cars or challenging mission profiles for automotive applications trigger new considerations about reliability determination and description, higher robustness and resilience. Presently the processes, design rules, reliability tests and specifications fit to standards which base on established degradation models and quality assurance processes. But the existing standards like electromigration and stress migration tests for interconnects do not cover all of the new requirements especially due to mechanical stress and stress related limits. The considerations for more robust, reliable and resilient products should encompass strategies for the identification of new failure mechanisms and their interactions, test structure and test method development, specification and validation concepts. The paper will explain by examples the challenges for reliability considerations from the perspective of process (primitive device), simulation and automotive industry. The examples will illustrate the difficulties, will highlight some existing gaps and will show first approaches for the description and specification of reliability and robustness.

Keywords

    Automotive, Interconnect, Reliability, Resilience, Robustness

ASJC Scopus subject areas

Cite this

'New automotive' - Considerations for reliability, robustness and resilience for CMOS interconnects. / Weide-Zaage, Kirsten; Fremont, Helene; Hein, Verena.
2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018. Institute of Electrical and Electronics Engineers Inc., 2018. p. 1-6 (2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018; Vol. 2018-January).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Weide-Zaage, K, Fremont, H & Hein, V 2018, 'New automotive' - Considerations for reliability, robustness and resilience for CMOS interconnects. in 2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018. 2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018, vol. 2018-January, Institute of Electrical and Electronics Engineers Inc., pp. 1-6, 2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018, Big Island, United States, 5 Feb 2018. https://doi.org/10.23919/panpacific.2018.8318993
Weide-Zaage, K., Fremont, H., & Hein, V. (2018). 'New automotive' - Considerations for reliability, robustness and resilience for CMOS interconnects. In 2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018 (pp. 1-6). (2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018; Vol. 2018-January). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.23919/panpacific.2018.8318993
Weide-Zaage K, Fremont H, Hein V. 'New automotive' - Considerations for reliability, robustness and resilience for CMOS interconnects. In 2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018. Institute of Electrical and Electronics Engineers Inc. 2018. p. 1-6. (2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018). doi: 10.23919/panpacific.2018.8318993
Weide-Zaage, Kirsten ; Fremont, Helene ; Hein, Verena. / 'New automotive' - Considerations for reliability, robustness and resilience for CMOS interconnects. 2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018. Institute of Electrical and Electronics Engineers Inc., 2018. pp. 1-6 (2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018).
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@inproceedings{59523944160d431d8e2864db44d381dd,
title = "'New automotive' - Considerations for reliability, robustness and resilience for CMOS interconnects",
abstract = "The technology evolution worsens the stress level of microelectronic applications. The shrinking, higher interconnect stacks, the diversity of functions, higher frequencies and power densities lead to higher stress and more interaction of effects. At package and assembly level the densification of internal interconnections, the combination of RF, digital, analog and power, new materials like lead free solder, more aggressive processes and 3D packages deliver new challenges for reliability performance. Requirements of harsh environment applications, the use of consumer products in cars or challenging mission profiles for automotive applications trigger new considerations about reliability determination and description, higher robustness and resilience. Presently the processes, design rules, reliability tests and specifications fit to standards which base on established degradation models and quality assurance processes. But the existing standards like electromigration and stress migration tests for interconnects do not cover all of the new requirements especially due to mechanical stress and stress related limits. The considerations for more robust, reliable and resilient products should encompass strategies for the identification of new failure mechanisms and their interactions, test structure and test method development, specification and validation concepts. The paper will explain by examples the challenges for reliability considerations from the perspective of process (primitive device), simulation and automotive industry. The examples will illustrate the difficulties, will highlight some existing gaps and will show first approaches for the description and specification of reliability and robustness.",
keywords = "Automotive, Interconnect, Reliability, Resilience, Robustness",
author = "Kirsten Weide-Zaage and Helene Fremont and Verena Hein",
note = "Publisher Copyright: {\textcopyright} 2018 SMTA. Copyright: Copyright 2018 Elsevier B.V., All rights reserved.; 2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018 ; Conference date: 05-02-2018 Through 08-02-2018",
year = "2018",
month = mar,
day = "15",
doi = "10.23919/panpacific.2018.8318993",
language = "English",
series = "2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "1--6",
booktitle = "2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018",
address = "United States",

}

Download

TY - GEN

T1 - 'New automotive' - Considerations for reliability, robustness and resilience for CMOS interconnects

AU - Weide-Zaage, Kirsten

AU - Fremont, Helene

AU - Hein, Verena

N1 - Publisher Copyright: © 2018 SMTA. Copyright: Copyright 2018 Elsevier B.V., All rights reserved.

PY - 2018/3/15

Y1 - 2018/3/15

N2 - The technology evolution worsens the stress level of microelectronic applications. The shrinking, higher interconnect stacks, the diversity of functions, higher frequencies and power densities lead to higher stress and more interaction of effects. At package and assembly level the densification of internal interconnections, the combination of RF, digital, analog and power, new materials like lead free solder, more aggressive processes and 3D packages deliver new challenges for reliability performance. Requirements of harsh environment applications, the use of consumer products in cars or challenging mission profiles for automotive applications trigger new considerations about reliability determination and description, higher robustness and resilience. Presently the processes, design rules, reliability tests and specifications fit to standards which base on established degradation models and quality assurance processes. But the existing standards like electromigration and stress migration tests for interconnects do not cover all of the new requirements especially due to mechanical stress and stress related limits. The considerations for more robust, reliable and resilient products should encompass strategies for the identification of new failure mechanisms and their interactions, test structure and test method development, specification and validation concepts. The paper will explain by examples the challenges for reliability considerations from the perspective of process (primitive device), simulation and automotive industry. The examples will illustrate the difficulties, will highlight some existing gaps and will show first approaches for the description and specification of reliability and robustness.

AB - The technology evolution worsens the stress level of microelectronic applications. The shrinking, higher interconnect stacks, the diversity of functions, higher frequencies and power densities lead to higher stress and more interaction of effects. At package and assembly level the densification of internal interconnections, the combination of RF, digital, analog and power, new materials like lead free solder, more aggressive processes and 3D packages deliver new challenges for reliability performance. Requirements of harsh environment applications, the use of consumer products in cars or challenging mission profiles for automotive applications trigger new considerations about reliability determination and description, higher robustness and resilience. Presently the processes, design rules, reliability tests and specifications fit to standards which base on established degradation models and quality assurance processes. But the existing standards like electromigration and stress migration tests for interconnects do not cover all of the new requirements especially due to mechanical stress and stress related limits. The considerations for more robust, reliable and resilient products should encompass strategies for the identification of new failure mechanisms and their interactions, test structure and test method development, specification and validation concepts. The paper will explain by examples the challenges for reliability considerations from the perspective of process (primitive device), simulation and automotive industry. The examples will illustrate the difficulties, will highlight some existing gaps and will show first approaches for the description and specification of reliability and robustness.

KW - Automotive

KW - Interconnect

KW - Reliability

KW - Resilience

KW - Robustness

UR - http://www.scopus.com/inward/record.url?scp=85050725858&partnerID=8YFLogxK

U2 - 10.23919/panpacific.2018.8318993

DO - 10.23919/panpacific.2018.8318993

M3 - Conference contribution

AN - SCOPUS:85050725858

T3 - 2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018

SP - 1

EP - 6

BT - 2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 2018 Pan Pacific Microelectronics Symposium, Pan Pacific 2018

Y2 - 5 February 2018 through 8 February 2018

ER -

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