Details
| Original language | English |
|---|---|
| Pages (from-to) | 27-35 |
| Number of pages | 9 |
| Journal | Surface science |
| Volume | 618 |
| Publication status | Published - Dec 2013 |
Abstract
Development of surface morphology in Si molecular beam epitaxy on mesa-structured Si(111) at temperatures around the (7 × 7)-"1 × 1" surface phase transition was studied by atomic force microscopy. Significant changes in surface morphology were found for a small increase in temperature near the surface phase transition, accompanied by a strong increase in step-free area dimension. This behavior is reported for the first time for epitaxial silicon growth, but supports earlier in situ studies of the thermal decay of 2-dimensional islands and voids on Si(111) close to the surface phase transition using low energy electron microscopy by Hibino et al. (Phys. Rev. B 63, 245402, 2001). The observed changes in surface morphology clearly demonstrate the interplay of crystal growth and the surface phase transformation. In particular, the simultaneous appearance of two surface phases under certain conditions and their specific influence on the growth behavior are discussed with regard to this matter.
Keywords
- Atomic force microscopy, Mesa, Molecular beam epitaxy, Silicon, Surface phase transition
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Materials Science(all)
- Surfaces, Coatings and Films
- Materials Science(all)
- Materials Chemistry
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In: Surface science, Vol. 618, 12.2013, p. 27-35.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Morphology of mesa surfaces on Si(111) prepared by molecular beam epitaxy at temperatures around the (7 × 7)-"1 × 1" surface phase transition
AU - Krügener, Jan
AU - Osten, H. Jörg
AU - Fissel, Andreas
PY - 2013/12
Y1 - 2013/12
N2 - Development of surface morphology in Si molecular beam epitaxy on mesa-structured Si(111) at temperatures around the (7 × 7)-"1 × 1" surface phase transition was studied by atomic force microscopy. Significant changes in surface morphology were found for a small increase in temperature near the surface phase transition, accompanied by a strong increase in step-free area dimension. This behavior is reported for the first time for epitaxial silicon growth, but supports earlier in situ studies of the thermal decay of 2-dimensional islands and voids on Si(111) close to the surface phase transition using low energy electron microscopy by Hibino et al. (Phys. Rev. B 63, 245402, 2001). The observed changes in surface morphology clearly demonstrate the interplay of crystal growth and the surface phase transformation. In particular, the simultaneous appearance of two surface phases under certain conditions and their specific influence on the growth behavior are discussed with regard to this matter.
AB - Development of surface morphology in Si molecular beam epitaxy on mesa-structured Si(111) at temperatures around the (7 × 7)-"1 × 1" surface phase transition was studied by atomic force microscopy. Significant changes in surface morphology were found for a small increase in temperature near the surface phase transition, accompanied by a strong increase in step-free area dimension. This behavior is reported for the first time for epitaxial silicon growth, but supports earlier in situ studies of the thermal decay of 2-dimensional islands and voids on Si(111) close to the surface phase transition using low energy electron microscopy by Hibino et al. (Phys. Rev. B 63, 245402, 2001). The observed changes in surface morphology clearly demonstrate the interplay of crystal growth and the surface phase transformation. In particular, the simultaneous appearance of two surface phases under certain conditions and their specific influence on the growth behavior are discussed with regard to this matter.
KW - Atomic force microscopy
KW - Mesa
KW - Molecular beam epitaxy
KW - Silicon
KW - Surface phase transition
UR - http://www.scopus.com/inward/record.url?scp=84885638960&partnerID=8YFLogxK
U2 - 10.1016/j.susc.2013.08.017
DO - 10.1016/j.susc.2013.08.017
M3 - Article
AN - SCOPUS:84885638960
VL - 618
SP - 27
EP - 35
JO - Surface science
JF - Surface science
SN - 0039-6028
ER -