Details
| Original language | English |
|---|---|
| Title of host publication | The 5th International Symposium on Electromagnetic Processing of Materials, EPM 2006 |
| Subtitle of host publication | October 23 - 27, 2006, Sendai International Center, Japan |
| Place of Publication | Tokyo |
| Pages | 155-159 |
| Publication status | Published - 2006 |
| Event | 5th International Symposium on Electromagnetic Processing of Materials - Sendai, Japan Duration: 23 Oct 2006 → 27 Oct 2006 Conference number: 5 |
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Modelling of using of magnetic fields in industrial single silicon crystal growth. / Nacke, Bernard; Muiznieks, A.; Lacis, K. et al.
The 5th International Symposium on Electromagnetic Processing of Materials, EPM 2006: October 23 - 27, 2006, Sendai International Center, Japan. Tokyo, 2006. p. 155-159.
The 5th International Symposium on Electromagnetic Processing of Materials, EPM 2006: October 23 - 27, 2006, Sendai International Center, Japan. Tokyo, 2006. p. 155-159.
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research
Nacke, B, Muiznieks, A, Lacis, K, Krauze, A & Rudevičs, A 2006, Modelling of using of magnetic fields in industrial single silicon crystal growth. in The 5th International Symposium on Electromagnetic Processing of Materials, EPM 2006: October 23 - 27, 2006, Sendai International Center, Japan. Tokyo, pp. 155-159, 5th International Symposium on Electromagnetic Processing of Materials, Sendai, Japan, 23 Oct 2006.
Nacke, B., Muiznieks, A., Lacis, K., Krauze, A., & Rudevičs, A. (2006). Modelling of using of magnetic fields in industrial single silicon crystal growth. In The 5th International Symposium on Electromagnetic Processing of Materials, EPM 2006: October 23 - 27, 2006, Sendai International Center, Japan (pp. 155-159).
Nacke B, Muiznieks A, Lacis K, Krauze A, Rudevičs A. Modelling of using of magnetic fields in industrial single silicon crystal growth. In The 5th International Symposium on Electromagnetic Processing of Materials, EPM 2006: October 23 - 27, 2006, Sendai International Center, Japan. Tokyo. 2006. p. 155-159
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title = "Modelling of using of magnetic fields in industrial single silicon crystal growth",
author = "Bernard Nacke and A. Muiznieks and K. Lacis and A. Krauze and A. Rudevi{\v c}s",
year = "2006",
language = "English",
isbn = "4-930980-55-0",
pages = "155--159",
booktitle = "The 5th International Symposium on Electromagnetic Processing of Materials, EPM 2006",
note = "5th International Symposium on Electromagnetic Processing of Materials ; Conference date: 23-10-2006 Through 27-10-2006",
}
Download
TY - GEN
T1 - Modelling of using of magnetic fields in industrial single silicon crystal growth
AU - Nacke, Bernard
AU - Muiznieks, A.
AU - Lacis, K.
AU - Krauze, A.
AU - Rudevičs, A.
N1 - Conference code: 5
PY - 2006
Y1 - 2006
M3 - Conference contribution
SN - 4-930980-55-0
SP - 155
EP - 159
BT - The 5th International Symposium on Electromagnetic Processing of Materials, EPM 2006
CY - Tokyo
T2 - 5th International Symposium on Electromagnetic Processing of Materials
Y2 - 23 October 2006 through 27 October 2006
ER -