Modeling the generation and dissociation of the boron-oxygen complex in B-Doped Cz-Si

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  • Institute for Solar Energy Research (ISFH)
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Details

Original languageEnglish
Title of host publication33rd IEEE Photovoltaic Specialists Conference, PVSC 2008
Publication statusPublished - 2008
Externally publishedYes
Event33rd IEEE Photovoltaic Specialists Conference, PVSC 2008 - San Diego, CA, United States
Duration: 11 May 200816 May 2008

Publication series

NameConference Record of the IEEE Photovoltaic Specialists Conference
ISSN (Print)0160-8371

Abstract

We demonstrate that the boron-oxygen (BsO2i) recombination center responsible for the light-induced degradation of Czochralski silicon solar cells can be deactivated by simultaneous annealing and illumination. After applying this deactivation treatment the improved carrier lifetime is shown to be stable under illumination at room temperature. The measured dependence of the deactivation rate as a function of temperature indicates that the process is thermally activated. Based on the experimental findings a defect reaction model is proposed which attributes the deactivation to a dissociation reaction of a complex XY of unknown composition and to the subsequent association of one component X of this complex with the oxygen dimer O2i into XO2i, thereby reducing the concentration of unbound O2i. An excellent agreement between the experimental and the modeled time dependence of the BsO2i concentration is found.

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Cite this

Modeling the generation and dissociation of the boron-oxygen complex in B-Doped Cz-Si. / Lim, Bianca; Bothe, Karsten; Schmidt, Jan.
33rd IEEE Photovoltaic Specialists Conference, PVSC 2008. 2008. 4922482 (Conference Record of the IEEE Photovoltaic Specialists Conference).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Lim, B, Bothe, K & Schmidt, J 2008, Modeling the generation and dissociation of the boron-oxygen complex in B-Doped Cz-Si. in 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008., 4922482, Conference Record of the IEEE Photovoltaic Specialists Conference, 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008, San Diego, CA, United States, 11 May 2008. https://doi.org/10.1109/PVSC.2008.4922482
Lim, B., Bothe, K., & Schmidt, J. (2008). Modeling the generation and dissociation of the boron-oxygen complex in B-Doped Cz-Si. In 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008 Article 4922482 (Conference Record of the IEEE Photovoltaic Specialists Conference). https://doi.org/10.1109/PVSC.2008.4922482
Lim B, Bothe K, Schmidt J. Modeling the generation and dissociation of the boron-oxygen complex in B-Doped Cz-Si. In 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008. 2008. 4922482. (Conference Record of the IEEE Photovoltaic Specialists Conference). doi: 10.1109/PVSC.2008.4922482
Lim, Bianca ; Bothe, Karsten ; Schmidt, Jan. / Modeling the generation and dissociation of the boron-oxygen complex in B-Doped Cz-Si. 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008. 2008. (Conference Record of the IEEE Photovoltaic Specialists Conference).
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