Details
| Translated title of the contribution | Microfluidic electroplating for the production of magnetoresistive layers |
|---|---|
| Original language | German |
| Title of host publication | MikroSystemTechnik Kongress 2017 "MEMS, Mikroelektronik, Systeme", Proceedings |
| Publisher | VDE Verlag GmbH |
| Pages | 313-316 |
| Number of pages | 4 |
| ISBN (electronic) | 9783800744916 |
| Publication status | Published - 2017 |
| Event | MikroSystemTechnik Kongress 2017: MEMS, Mikroelektronik, Systeme - München, Germany Duration: 23 Oct 2017 → 25 Oct 2017 |
Publication series
| Name | MikroSystemTechnik Kongress 2017 "MEMS, Mikroelektronik, Systeme", Proceedings |
|---|
Abstract
A new method to create electroplated microstructures by pattern transfer is to be investigated. The new technique has no need of photolithography steps, a Silicone mold is employed instead. The Silicon mold consists of the anodic wire and the microfluidic channel, through which the electrolyte is pumped through. In this paper the ability of this plating technique to create magnetoresistive structures and the influence of the plating parameters on them is analyzed. The investigated parameters are as follow: current density, volume flow and the sampling rate of the current source. The samples are analyzed regarding their atomic composition, their sensitivity in a homogeneous magnetic field and the deposited height. The Atomic composition can ne varied from 75 % Nickel to 85% Nickel. The deposited layer have a height varying from 1.7 µm to 5 µm. Structures having a sensitivity to an extern magnetic field are realized. The change in resistivity is about 0.4 % ΔR / R0
ASJC Scopus subject areas
- Engineering(all)
- Electrical and Electronic Engineering
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Materials Science(all)
- Surfaces, Coatings and Films
- Physics and Astronomy(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Atomic and Molecular Physics, and Optics
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MikroSystemTechnik Kongress 2017 "MEMS, Mikroelektronik, Systeme", Proceedings. VDE Verlag GmbH, 2017. p. 313-316 (MikroSystemTechnik Kongress 2017 "MEMS, Mikroelektronik, Systeme", Proceedings).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Mikrofluidische Galvanik zur Herstellung magnetoresistiver Schichten
AU - Rechel, Mathias
AU - Taptimthong, Piriya
AU - Arndt, Matthias
AU - Wurz, Marc Christopher
N1 - Publisher Copyright: © 2017 MEMS.All right reserved. Copyright: Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2017
Y1 - 2017
N2 - A new method to create electroplated microstructures by pattern transfer is to be investigated. The new technique has no need of photolithography steps, a Silicone mold is employed instead. The Silicon mold consists of the anodic wire and the microfluidic channel, through which the electrolyte is pumped through. In this paper the ability of this plating technique to create magnetoresistive structures and the influence of the plating parameters on them is analyzed. The investigated parameters are as follow: current density, volume flow and the sampling rate of the current source. The samples are analyzed regarding their atomic composition, their sensitivity in a homogeneous magnetic field and the deposited height. The Atomic composition can ne varied from 75 % Nickel to 85% Nickel. The deposited layer have a height varying from 1.7 µm to 5 µm. Structures having a sensitivity to an extern magnetic field are realized. The change in resistivity is about 0.4 % ΔR / R0
AB - A new method to create electroplated microstructures by pattern transfer is to be investigated. The new technique has no need of photolithography steps, a Silicone mold is employed instead. The Silicon mold consists of the anodic wire and the microfluidic channel, through which the electrolyte is pumped through. In this paper the ability of this plating technique to create magnetoresistive structures and the influence of the plating parameters on them is analyzed. The investigated parameters are as follow: current density, volume flow and the sampling rate of the current source. The samples are analyzed regarding their atomic composition, their sensitivity in a homogeneous magnetic field and the deposited height. The Atomic composition can ne varied from 75 % Nickel to 85% Nickel. The deposited layer have a height varying from 1.7 µm to 5 µm. Structures having a sensitivity to an extern magnetic field are realized. The change in resistivity is about 0.4 % ΔR / R0
UR - http://www.scopus.com/inward/record.url?scp=85096807150&partnerID=8YFLogxK
M3 - Aufsatz in Konferenzband
AN - SCOPUS:85096807150
T3 - MikroSystemTechnik Kongress 2017 "MEMS, Mikroelektronik, Systeme", Proceedings
SP - 313
EP - 316
BT - MikroSystemTechnik Kongress 2017 "MEMS, Mikroelektronik, Systeme", Proceedings
PB - VDE Verlag GmbH
T2 - MikroSystemTechnik Kongress 2017: MEMS, Mikroelektronik, Systeme
Y2 - 23 October 2017 through 25 October 2017
ER -