Microstructured reaction areas for the deposition of silica

Research output: Contribution to journal › Article › Research › peer review

Authors

  • Olaf Helmecke
  • Alexander Hirsch
  • Peter Behrens
  • Henning Menzel

Research Organisations

External Research Organisations

  • Technische Universität Braunschweig
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Details

Original languageEnglish
Pages (from-to)225-231
Number of pages7
JournalColloid and polymer science
Volume286
Issue number2
Publication statusPublished - 9 Oct 2007

Abstract

Patterned films with hexagonal structures were prepared by photochemical grafting of hydrophobic poly(acrylic acid 2-ethyl-hexylester) (PEHAA) as barrier and poly(ethylene imine) (PEI) as reaction area. The films have been characterized by ellipsometry, contact angle measurements, and scanning electron microscopy (SEM). These patterned films have been used in silica mineralization experiments by dipping them into a silica precursor solution. Silica deposition occurs only in PEI-coated areas, resulting in regular arrays of lens-shaped silica particles. The deposited silica was investigated by SEM and atomic force microscopy (AFM).

Keywords

    Photochemical grafting, Poly(ethyleneimine), Silica deposition, Surface patterning

ASJC Scopus subject areas

Cite this

Microstructured reaction areas for the deposition of silica. / Helmecke, Olaf; Hirsch, Alexander; Behrens, Peter et al.
In: Colloid and polymer science, Vol. 286, No. 2, 09.10.2007, p. 225-231.

Research output: Contribution to journal › Article › Research › peer review

Helmecke, O, Hirsch, A, Behrens, P & Menzel, H 2007, 'Microstructured reaction areas for the deposition of silica', Colloid and polymer science, vol. 286, no. 2, pp. 225-231. https://doi.org/10.1007/s00396-007-1773-y
Helmecke O, Hirsch A, Behrens P, Menzel H. Microstructured reaction areas for the deposition of silica. Colloid and polymer science. 2007 Oct 9;286(2):225-231. doi: 10.1007/s00396-007-1773-y
Helmecke, Olaf ; Hirsch, Alexander ; Behrens, Peter et al. / Microstructured reaction areas for the deposition of silica. In: Colloid and polymer science. 2007 ; Vol. 286, No. 2. pp. 225-231.
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abstract = "Patterned films with hexagonal structures were prepared by photochemical grafting of hydrophobic poly(acrylic acid 2-ethyl-hexylester) (PEHAA) as barrier and poly(ethylene imine) (PEI) as reaction area. The films have been characterized by ellipsometry, contact angle measurements, and scanning electron microscopy (SEM). These patterned films have been used in silica mineralization experiments by dipping them into a silica precursor solution. Silica deposition occurs only in PEI-coated areas, resulting in regular arrays of lens-shaped silica particles. The deposited silica was investigated by SEM and atomic force microscopy (AFM).",
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