Details
| Original language | English |
|---|---|
| Title of host publication | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII |
| Editors | Georg von Freymann, Eva Blasco, Debashis Chanda |
| Publisher | SPIE |
| Number of pages | 7 |
| ISBN (electronic) | 9781510633476 |
| Publication status | Published - 28 Feb 2020 |
| Event | Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII 2020 - San Francisco, United States Duration: 2 Feb 2020 → 5 Feb 2020 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 11292 |
| ISSN (Print) | 0277-786X |
| ISSN (electronic) | 1996-756X |
Abstract
Lithography is one of the key technologies employed for the fabrication of optical devices and components, which could be applied in fields as diverse as optical sensing, communication and information technologies. Microscope projection photolithography (MPP), as a low-cost, simple and flexible lithography method, lends itself for versatile applications. Its feasibility in realizing various microstructures has been verified already. However, the improvement of the quality and resolution of structures still remains challenging. Here, we present an MPP method for the controlled generation of high-quality and high-resolution 2D optical micro- and nanostructures. Particularly, an improved process chain, which significantly shortens the time from structure design to the realization to less than one day, is introduced. The structures, first designed with vector-graphics software, are printed on a commercial transparency film. Then, the film is placed into a self-developed setup, and the structure patterns are transferred onto a chromium photomask with a demagnification of 10:1, for example. The last step is to place the chromium photomask into the MPP arrangement and implement the fabrication using a microscope objective to demagnify and project structure patterns onto photoresist which is simultaneously exposed to UV light. With this process chain, periodic structures with a minimum feature size of 150 nm were realized using an objective with NA of 1.4. Furthermore, various photonic components such as micro ring resonators and arrayed waveguide gratings with high quality were generated with application potential, e. g. in sensing and monitoring.
Keywords
- High-resolution structuring, Microscope projection photolithography, Op- tics and photonics, Optical manufacturing
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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- Apa
- Vancouver
- BibTeX
- RIS
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII. ed. / Georg von Freymann; Eva Blasco; Debashis Chanda. SPIE, 2020. 112920Q (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 11292).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Microscope Projection Photolithography of Polymeric Optical Micro- and Nanocomponents
AU - Zheng, Lei
AU - Reinhardt, Carsten
AU - Roth, Bernhard
N1 - Funding Information: The authors appreciate the support of Urs Zywietz and Tobias Birr and their involvement in the experiment. The authors also acknowledge the financial support from the Deutsche Forschungsgemeinschaft (DFG) under Germany’s Excellence Strategy within the Cluster of Excellence PhoenixD (EXC 2122, Project ID 390833453) and the DFG (German Research Foundation, Project ID RE3012/4-1 and RE3012/2-1).
PY - 2020/2/28
Y1 - 2020/2/28
N2 - Lithography is one of the key technologies employed for the fabrication of optical devices and components, which could be applied in fields as diverse as optical sensing, communication and information technologies. Microscope projection photolithography (MPP), as a low-cost, simple and flexible lithography method, lends itself for versatile applications. Its feasibility in realizing various microstructures has been verified already. However, the improvement of the quality and resolution of structures still remains challenging. Here, we present an MPP method for the controlled generation of high-quality and high-resolution 2D optical micro- and nanostructures. Particularly, an improved process chain, which significantly shortens the time from structure design to the realization to less than one day, is introduced. The structures, first designed with vector-graphics software, are printed on a commercial transparency film. Then, the film is placed into a self-developed setup, and the structure patterns are transferred onto a chromium photomask with a demagnification of 10:1, for example. The last step is to place the chromium photomask into the MPP arrangement and implement the fabrication using a microscope objective to demagnify and project structure patterns onto photoresist which is simultaneously exposed to UV light. With this process chain, periodic structures with a minimum feature size of 150 nm were realized using an objective with NA of 1.4. Furthermore, various photonic components such as micro ring resonators and arrayed waveguide gratings with high quality were generated with application potential, e. g. in sensing and monitoring.
AB - Lithography is one of the key technologies employed for the fabrication of optical devices and components, which could be applied in fields as diverse as optical sensing, communication and information technologies. Microscope projection photolithography (MPP), as a low-cost, simple and flexible lithography method, lends itself for versatile applications. Its feasibility in realizing various microstructures has been verified already. However, the improvement of the quality and resolution of structures still remains challenging. Here, we present an MPP method for the controlled generation of high-quality and high-resolution 2D optical micro- and nanostructures. Particularly, an improved process chain, which significantly shortens the time from structure design to the realization to less than one day, is introduced. The structures, first designed with vector-graphics software, are printed on a commercial transparency film. Then, the film is placed into a self-developed setup, and the structure patterns are transferred onto a chromium photomask with a demagnification of 10:1, for example. The last step is to place the chromium photomask into the MPP arrangement and implement the fabrication using a microscope objective to demagnify and project structure patterns onto photoresist which is simultaneously exposed to UV light. With this process chain, periodic structures with a minimum feature size of 150 nm were realized using an objective with NA of 1.4. Furthermore, various photonic components such as micro ring resonators and arrayed waveguide gratings with high quality were generated with application potential, e. g. in sensing and monitoring.
KW - High-resolution structuring
KW - Microscope projection photolithography
KW - Op- tics and photonics
KW - Optical manufacturing
UR - http://www.scopus.com/inward/record.url?scp=85084181050&partnerID=8YFLogxK
U2 - 10.1117/12.2546679
DO - 10.1117/12.2546679
M3 - Conference contribution
AN - SCOPUS:85084181050
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII
A2 - von Freymann, Georg
A2 - Blasco, Eva
A2 - Chanda, Debashis
PB - SPIE
T2 - Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XIII 2020
Y2 - 2 February 2020 through 5 February 2020
ER -