Details
| Original language | English |
|---|---|
| Title of host publication | Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries |
| Subtitle of host publication | 30 - 31 July 2000, San Diego, USA |
| Place of Publication | Bellingham |
| Publisher | SPIE |
| Pages | 82-90 |
| Number of pages | 9 |
| Edition | 1 |
| ISBN (print) | 0-8194-3744-1 |
| Publication status | Published - 2 Nov 2000 |
| Externally published | Yes |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Publisher | SPIE |
| Volume | 4099 |
| ISSN (Print) | 0277-786X |
Abstract
For the roughness characterization of optical surfaces a new procedure based on the analysis of their power spectral density (PSD) functions has been developed. The method consists of the fitting of the PSD obtained from Atomic Force Microscopy measurements at different scan sizes to mathematical models. With this procedure the micro-structural properties of optical surfaces and coatings can be represented by a reduced set of numbers that correspond to the characteristic parameters of the mathematical models. For optical coatings this method allows a separate study of the influence of the substrate and layers on the overall sample roughness. As an example, the method is applied to MgF2 and LaF3 films for VUV applications. We investigated a set of single layers deposited onto superpolished CAF2, fused silica and Si substrates. The samples were deposited by ion beam sputtering, boat and e-beam evaporation. A comparison of the influence of the substrate on the development of the roughnesses and lateral structures has been performed, as well as a study of the dependence of the roughness properties of the coatings on the deposition process. Complementary investigations of roughness-related scattering consisting of measurements of Total Scatter at 193 nm and 633 nm and calculation of expected scattering based on the theory are presented.
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries: 30 - 31 July 2000, San Diego, USA. 1. ed. Bellingham: SPIE, 2000. p. 82-90 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 4099).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Microroughness analysis of thin film components for VUV applications
AU - Ferré-Borrull, Josep
AU - Duparŕ, Angela
AU - Steinert, Joerg
AU - Ristau, Detlev
AU - Quesnel, Etienne
PY - 2000/11/2
Y1 - 2000/11/2
N2 - For the roughness characterization of optical surfaces a new procedure based on the analysis of their power spectral density (PSD) functions has been developed. The method consists of the fitting of the PSD obtained from Atomic Force Microscopy measurements at different scan sizes to mathematical models. With this procedure the micro-structural properties of optical surfaces and coatings can be represented by a reduced set of numbers that correspond to the characteristic parameters of the mathematical models. For optical coatings this method allows a separate study of the influence of the substrate and layers on the overall sample roughness. As an example, the method is applied to MgF2 and LaF3 films for VUV applications. We investigated a set of single layers deposited onto superpolished CAF2, fused silica and Si substrates. The samples were deposited by ion beam sputtering, boat and e-beam evaporation. A comparison of the influence of the substrate on the development of the roughnesses and lateral structures has been performed, as well as a study of the dependence of the roughness properties of the coatings on the deposition process. Complementary investigations of roughness-related scattering consisting of measurements of Total Scatter at 193 nm and 633 nm and calculation of expected scattering based on the theory are presented.
AB - For the roughness characterization of optical surfaces a new procedure based on the analysis of their power spectral density (PSD) functions has been developed. The method consists of the fitting of the PSD obtained from Atomic Force Microscopy measurements at different scan sizes to mathematical models. With this procedure the micro-structural properties of optical surfaces and coatings can be represented by a reduced set of numbers that correspond to the characteristic parameters of the mathematical models. For optical coatings this method allows a separate study of the influence of the substrate and layers on the overall sample roughness. As an example, the method is applied to MgF2 and LaF3 films for VUV applications. We investigated a set of single layers deposited onto superpolished CAF2, fused silica and Si substrates. The samples were deposited by ion beam sputtering, boat and e-beam evaporation. A comparison of the influence of the substrate on the development of the roughnesses and lateral structures has been performed, as well as a study of the dependence of the roughness properties of the coatings on the deposition process. Complementary investigations of roughness-related scattering consisting of measurements of Total Scatter at 193 nm and 633 nm and calculation of expected scattering based on the theory are presented.
UR - http://www.scopus.com/inward/record.url?scp=0034547199&partnerID=8YFLogxK
U2 - 10.1117/12.405810
DO - 10.1117/12.405810
M3 - Conference contribution
AN - SCOPUS:0034547199
SN - 0-8194-3744-1
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 82
EP - 90
BT - Optical Metrology Roadmap for the Semiconductor, Optical, and Data Storage Industries
PB - SPIE
CY - Bellingham
ER -