Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

  • Morten Steinecke
  • Tarik Kellermann
  • Marco Jupé
  • Detlev Ristau
  • Lars Jensen

Research Organisations

External Research Organisations

  • Laser Zentrum Hannover e.V. (LZH)
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Details

Original languageEnglish
Title of host publication50th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials 2018
PublisherSPIE
ISBN (electronic)9781510621930
Publication statusPublished - 20 Nov 2018
Event50th Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials 2018 - Boulder, United States
Duration: 23 Sept 201826 Sept 2018

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10805
ISSN (Print)0277-786X
ISSN (electronic)1996-756X

Abstract

The exploitation of nonlinear effects in multi-layer thin films allows for optics with novel functions, such as all-optical switching and frequency conversion. In this contribution, an improved interferometric setup for the measurement of the nonlinear refractive index in dielectric substrates and deposited single layers is presented. The setup is based on the wave front deformation caused by the self-focusing in the measured samples. Additionally, measurement results for a highly nonlinear material, indium-Tin-oxide (ITO) are presented with respect to the materials power handling capabilities and compared to values from other materials.

Keywords

    Kerr-effect, Material science, Nonlinear optics, Self-focusing, Thin films

ASJC Scopus subject areas

Cite this

Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity. / Steinecke, Morten; Kellermann, Tarik; Jupé, Marco et al.
50th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials 2018. SPIE, 2018. 1080524 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10805).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Steinecke, M, Kellermann, T, Jupé, M, Ristau, D & Jensen, L 2018, Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity. in 50th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials 2018., 1080524, Proceedings of SPIE - The International Society for Optical Engineering, vol. 10805, SPIE, 50th Annual Laser Damage Symposium - Laser-Induced Damage in Optical Materials 2018, Boulder, United States, 23 Sept 2018. https://doi.org/10.1117/12.2500341, https://doi.org/10.15488/10266
Steinecke, M., Kellermann, T., Jupé, M., Ristau, D., & Jensen, L. (2018). Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity. In 50th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials 2018 Article 1080524 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10805). SPIE. https://doi.org/10.1117/12.2500341, https://doi.org/10.15488/10266
Steinecke M, Kellermann T, Jupé M, Ristau D, Jensen L. Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity. In 50th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials 2018. SPIE. 2018. 1080524. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2500341, 10.15488/10266
Steinecke, Morten ; Kellermann, Tarik ; Jupé, Marco et al. / Measurement setup for the determination of the nonlinear refractive index of thin films with high nonlinearity. 50th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials 2018. SPIE, 2018. (Proceedings of SPIE - The International Society for Optical Engineering).
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abstract = "The exploitation of nonlinear effects in multi-layer thin films allows for optics with novel functions, such as all-optical switching and frequency conversion. In this contribution, an improved interferometric setup for the measurement of the nonlinear refractive index in dielectric substrates and deposited single layers is presented. The setup is based on the wave front deformation caused by the self-focusing in the measured samples. Additionally, measurement results for a highly nonlinear material, indium-Tin-oxide (ITO) are presented with respect to the materials power handling capabilities and compared to values from other materials.",
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