Low-temperature rear surface passivation schemes for > 20 % efficient silicon solar cells

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Authors

External Research Organisations

  • Institute for Solar Energy Research (ISFH)
  • ErSol Solar Energy AG
  • RWE Power AG
View graph of relations

Details

Original languageEnglish
Title of host publicationProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
EditorsK. Kurokawa, L.L. Kazmerski, B. McNeils, M. Yamaguchi, C. Wronski
Pages1395-1398
Number of pages4
Publication statusPublished - 2003
Externally publishedYes
Event3rd World Conference on Photovoltaic Energy Conversion - Osaka, Japan
Duration: 11 May 200318 May 2003

Publication series

NameProceedings of the 3rd World Conference on Photovoltaic Energy Conversion
VolumeB

Abstract

Results of different types of crystalline silicon solar cells passivated using low-temperature plasma-enhanced chemical vapour deposited (PECVD) films of amorphous silicon (a-Si:H) and silicon nitride (SiNx) are presented. The SiNx films are deposited at 400 °C and the a-Si:H films at 225 °C, respectively. An independently confirmed efficiency of 20.6 % is achieved for SiNx-passivated cells with an additional local back surface field (LBSF) underneath the rear metalised area. The LBSF reduces carrier recombination at the metal contacts and avoids parasitic shunting between the induced inversion layer underneath the SiNx films and the rear contact lines. Furthermore, it is shown that a-Si:H films provide an excellent surface passivation without inducing an inversion layer. Efficiencies of 19.2% are reported for solar cells with a-Si:H rear surface passivation. Open-circuit voltages in excess of 650 mV demonstrate that efficiencies >20% are well achievable for a-Si:H rear surface passivated solar cells.

ASJC Scopus subject areas

Cite this

Low-temperature rear surface passivation schemes for > 20 % efficient silicon solar cells. / Dauwe, S.; Mittelstädt, L.; Metz, A. et al.
Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. ed. / K. Kurokawa; L.L. Kazmerski; B. McNeils; M. Yamaguchi; C. Wronski. 2003. p. 1395-1398 (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion; Vol. B).

Research output: Chapter in book/report/conference proceedingConference contributionResearchpeer review

Dauwe, S, Mittelstädt, L, Metz, A, Schmidt, J & Hezel, R 2003, Low-temperature rear surface passivation schemes for > 20 % efficient silicon solar cells. in K Kurokawa, LL Kazmerski, B McNeils, M Yamaguchi & C Wronski (eds), Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion, vol. B, pp. 1395-1398, 3rd World Conference on Photovoltaic Energy Conversion, Osaka, Japan, 11 May 2003.
Dauwe, S., Mittelstädt, L., Metz, A., Schmidt, J., & Hezel, R. (2003). Low-temperature rear surface passivation schemes for > 20 % efficient silicon solar cells. In K. Kurokawa, L. L. Kazmerski, B. McNeils, M. Yamaguchi, & C. Wronski (Eds.), Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion (pp. 1395-1398). (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion; Vol. B).
Dauwe S, Mittelstädt L, Metz A, Schmidt J, Hezel R. Low-temperature rear surface passivation schemes for > 20 % efficient silicon solar cells. In Kurokawa K, Kazmerski LL, McNeils B, Yamaguchi M, Wronski C, editors, Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. 2003. p. 1395-1398. (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion).
Dauwe, S. ; Mittelstädt, L. ; Metz, A. et al. / Low-temperature rear surface passivation schemes for > 20 % efficient silicon solar cells. Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. editor / K. Kurokawa ; L.L. Kazmerski ; B. McNeils ; M. Yamaguchi ; C. Wronski. 2003. pp. 1395-1398 (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion).
Download
@inproceedings{10191ff0007d40408677ccbf653bca4b,
title = "Low-temperature rear surface passivation schemes for > 20 % efficient silicon solar cells",
abstract = "Results of different types of crystalline silicon solar cells passivated using low-temperature plasma-enhanced chemical vapour deposited (PECVD) films of amorphous silicon (a-Si:H) and silicon nitride (SiNx) are presented. The SiNx films are deposited at 400 °C and the a-Si:H films at 225 °C, respectively. An independently confirmed efficiency of 20.6 % is achieved for SiNx-passivated cells with an additional local back surface field (LBSF) underneath the rear metalised area. The LBSF reduces carrier recombination at the metal contacts and avoids parasitic shunting between the induced inversion layer underneath the SiNx films and the rear contact lines. Furthermore, it is shown that a-Si:H films provide an excellent surface passivation without inducing an inversion layer. Efficiencies of 19.2% are reported for solar cells with a-Si:H rear surface passivation. Open-circuit voltages in excess of 650 mV demonstrate that efficiencies >20% are well achievable for a-Si:H rear surface passivated solar cells.",
author = "S. Dauwe and L. Mittelst{\"a}dt and A. Metz and J. Schmidt and R. Hezel",
year = "2003",
language = "English",
isbn = "4990181603",
series = "Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion",
pages = "1395--1398",
editor = "K. Kurokawa and L.L. Kazmerski and B. McNeils and M. Yamaguchi and C. Wronski",
booktitle = "Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion",
note = "3rd World Conference on Photovoltaic Energy Conversion ; Conference date: 11-05-2003 Through 18-05-2003",

}

Download

TY - GEN

T1 - Low-temperature rear surface passivation schemes for > 20 % efficient silicon solar cells

AU - Dauwe, S.

AU - Mittelstädt, L.

AU - Metz, A.

AU - Schmidt, J.

AU - Hezel, R.

PY - 2003

Y1 - 2003

N2 - Results of different types of crystalline silicon solar cells passivated using low-temperature plasma-enhanced chemical vapour deposited (PECVD) films of amorphous silicon (a-Si:H) and silicon nitride (SiNx) are presented. The SiNx films are deposited at 400 °C and the a-Si:H films at 225 °C, respectively. An independently confirmed efficiency of 20.6 % is achieved for SiNx-passivated cells with an additional local back surface field (LBSF) underneath the rear metalised area. The LBSF reduces carrier recombination at the metal contacts and avoids parasitic shunting between the induced inversion layer underneath the SiNx films and the rear contact lines. Furthermore, it is shown that a-Si:H films provide an excellent surface passivation without inducing an inversion layer. Efficiencies of 19.2% are reported for solar cells with a-Si:H rear surface passivation. Open-circuit voltages in excess of 650 mV demonstrate that efficiencies >20% are well achievable for a-Si:H rear surface passivated solar cells.

AB - Results of different types of crystalline silicon solar cells passivated using low-temperature plasma-enhanced chemical vapour deposited (PECVD) films of amorphous silicon (a-Si:H) and silicon nitride (SiNx) are presented. The SiNx films are deposited at 400 °C and the a-Si:H films at 225 °C, respectively. An independently confirmed efficiency of 20.6 % is achieved for SiNx-passivated cells with an additional local back surface field (LBSF) underneath the rear metalised area. The LBSF reduces carrier recombination at the metal contacts and avoids parasitic shunting between the induced inversion layer underneath the SiNx films and the rear contact lines. Furthermore, it is shown that a-Si:H films provide an excellent surface passivation without inducing an inversion layer. Efficiencies of 19.2% are reported for solar cells with a-Si:H rear surface passivation. Open-circuit voltages in excess of 650 mV demonstrate that efficiencies >20% are well achievable for a-Si:H rear surface passivated solar cells.

UR - http://www.scopus.com/inward/record.url?scp=3142736155&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:3142736155

SN - 4990181603

SN - 9784990181604

T3 - Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

SP - 1395

EP - 1398

BT - Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion

A2 - Kurokawa, K.

A2 - Kazmerski, L.L.

A2 - McNeils, B.

A2 - Yamaguchi, M.

A2 - Wronski, C.

T2 - 3rd World Conference on Photovoltaic Energy Conversion

Y2 - 11 May 2003 through 18 May 2003

ER -

By the same author(s)