Local structure of strain-compensated epitaxial Si1−x−yGexCy layers on Si(001) grown with molecular beam epitaxy

Research output: Contribution to journalArticleResearchpeer review

Authors

  • H. J. Osten
  • B. Dietrich
  • H. Rücker
  • M. Methfessel

External Research Organisations

  • Leibniz Institute for High Performance Microelectronics (IHP)
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Details

Original languageEnglish
Pages (from-to)931-933
Number of pages3
JournalJournal of crystal growth
Volume150
Publication statusPublished - 1 May 1995
Externally publishedYes

Abstract

We show that it is possible to adjust the strain in pseudomorphic SiGe layers on Si(001) by adding small amounts of carbon. A strain-free Si1−x−yGexCy layer can be grown on Si(001) by choosing the concentrations x and y such that the volume changes due to the germanium and carbon atoms compensate. The local atomic structure and lattice dynamics of a strain-compensated layer are studied. Experimental and theoretical results are compatible with Vegard's rule. To handle the large bond length distortion near C atoms properly, the used valence-force field model includes anharmonic effects via bond length dependent interatomic force constants which were determined from ab initio density-functional calculations. The dependence of Raman spectra on strain and composition of Si1−x−yGexCy layers can be explained by the model calculations.

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Local structure of strain-compensated epitaxial Si1−x−yGexCy layers on Si(001) grown with molecular beam epitaxy. / Osten, H. J.; Dietrich, B.; Rücker, H. et al.
In: Journal of crystal growth, Vol. 150, 01.05.1995, p. 931-933.

Research output: Contribution to journalArticleResearchpeer review

Osten HJ, Dietrich B, Rücker H, Methfessel M. Local structure of strain-compensated epitaxial Si1−x−yGexCy layers on Si(001) grown with molecular beam epitaxy. Journal of crystal growth. 1995 May 1;150:931-933. doi: 10.1016/0022-0248(95)80076-O
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abstract = "We show that it is possible to adjust the strain in pseudomorphic SiGe layers on Si(001) by adding small amounts of carbon. A strain-free Si1−x−yGexCy layer can be grown on Si(001) by choosing the concentrations x and y such that the volume changes due to the germanium and carbon atoms compensate. The local atomic structure and lattice dynamics of a strain-compensated layer are studied. Experimental and theoretical results are compatible with Vegard's rule. To handle the large bond length distortion near C atoms properly, the used valence-force field model includes anharmonic effects via bond length dependent interatomic force constants which were determined from ab initio density-functional calculations. The dependence of Raman spectra on strain and composition of Si1−x−yGexCy layers can be explained by the model calculations.",
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T1 - Local structure of strain-compensated epitaxial Si1−x−yGexCy layers on Si(001) grown with molecular beam epitaxy

AU - Osten, H. J.

AU - Dietrich, B.

AU - Rücker, H.

AU - Methfessel, M.

PY - 1995/5/1

Y1 - 1995/5/1

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AB - We show that it is possible to adjust the strain in pseudomorphic SiGe layers on Si(001) by adding small amounts of carbon. A strain-free Si1−x−yGexCy layer can be grown on Si(001) by choosing the concentrations x and y such that the volume changes due to the germanium and carbon atoms compensate. The local atomic structure and lattice dynamics of a strain-compensated layer are studied. Experimental and theoretical results are compatible with Vegard's rule. To handle the large bond length distortion near C atoms properly, the used valence-force field model includes anharmonic effects via bond length dependent interatomic force constants which were determined from ab initio density-functional calculations. The dependence of Raman spectra on strain and composition of Si1−x−yGexCy layers can be explained by the model calculations.

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