Details
| Original language | English |
|---|---|
| Title of host publication | 37th Annual Boulder Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials |
| Subtitle of host publication | 2006 |
| Publication status | Published - 15 Jan 2007 |
| Externally published | Yes |
| Event | 37th Annual Boulder Damage Symposium - Laser-Induced Damage in Optical Materials: 2006 - Boulder, CO, United States Duration: 25 Sept 2006 → 27 Sept 2006 |
Publication series
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Volume | 6403 |
| ISSN (Print) | 0277-786X |
Abstract
Standard DUV mirror systems with conventional quarterwave design were deposited from oxide materials by ion beam sputtering deposition (IBS) and from fluoride materials by conventional thermal evaporation for the wavelength 193 nm. In addition, a protected fluoride mirror system was manufactured consisting of a conventional fluoride stack with a dense SiO2 protection layer. In a comparative study, these mirror systems were characterised in respect to their optical properties and absorption in the VUV spectral range. Subsequently, the value of the laser-induced damage threshold (LIDT) of the mirrors was determined in an S-on-1 procedure. All DUV measurements were conducted under the conditions of nitrogen purging. It was observed that all mirror system exhibit a similar optical performance and loss levels at 193 nm. However, it was found for the LIDT value, that for IBS oxide system the damage mechanism is defect induced at a comparable low level, whereas the LIDT value of evaporated fluoride mirror is absorption induced, with 1-on-1 values of up to 6 J/cm2. The protected fluoride mirror exhibits value in the intermediate range.
Keywords
- Coating deposition, Radiation resistance, VUV characterisation, VUV LIDT
ASJC Scopus subject areas
- Materials Science(all)
- Electronic, Optical and Magnetic Materials
- Physics and Astronomy(all)
- Condensed Matter Physics
- Computer Science(all)
- Computer Science Applications
- Mathematics(all)
- Applied Mathematics
- Engineering(all)
- Electrical and Electronic Engineering
Cite this
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- BibTeX
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37th Annual Boulder Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2006. 2007. 640318 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6403).
Research output: Chapter in book/report/conference proceeding › Conference contribution › Research › peer review
}
TY - GEN
T1 - Laser resistivity of selected multilayer designs for DUV/VUV applications
AU - Günster, Stefan
AU - Blaschke, Holger
AU - Ristau, Detlev
PY - 2007/1/15
Y1 - 2007/1/15
N2 - Standard DUV mirror systems with conventional quarterwave design were deposited from oxide materials by ion beam sputtering deposition (IBS) and from fluoride materials by conventional thermal evaporation for the wavelength 193 nm. In addition, a protected fluoride mirror system was manufactured consisting of a conventional fluoride stack with a dense SiO2 protection layer. In a comparative study, these mirror systems were characterised in respect to their optical properties and absorption in the VUV spectral range. Subsequently, the value of the laser-induced damage threshold (LIDT) of the mirrors was determined in an S-on-1 procedure. All DUV measurements were conducted under the conditions of nitrogen purging. It was observed that all mirror system exhibit a similar optical performance and loss levels at 193 nm. However, it was found for the LIDT value, that for IBS oxide system the damage mechanism is defect induced at a comparable low level, whereas the LIDT value of evaporated fluoride mirror is absorption induced, with 1-on-1 values of up to 6 J/cm2. The protected fluoride mirror exhibits value in the intermediate range.
AB - Standard DUV mirror systems with conventional quarterwave design were deposited from oxide materials by ion beam sputtering deposition (IBS) and from fluoride materials by conventional thermal evaporation for the wavelength 193 nm. In addition, a protected fluoride mirror system was manufactured consisting of a conventional fluoride stack with a dense SiO2 protection layer. In a comparative study, these mirror systems were characterised in respect to their optical properties and absorption in the VUV spectral range. Subsequently, the value of the laser-induced damage threshold (LIDT) of the mirrors was determined in an S-on-1 procedure. All DUV measurements were conducted under the conditions of nitrogen purging. It was observed that all mirror system exhibit a similar optical performance and loss levels at 193 nm. However, it was found for the LIDT value, that for IBS oxide system the damage mechanism is defect induced at a comparable low level, whereas the LIDT value of evaporated fluoride mirror is absorption induced, with 1-on-1 values of up to 6 J/cm2. The protected fluoride mirror exhibits value in the intermediate range.
KW - Coating deposition
KW - Radiation resistance
KW - VUV characterisation
KW - VUV LIDT
UR - http://www.scopus.com/inward/record.url?scp=34247338535&partnerID=8YFLogxK
U2 - 10.1117/12.696241
DO - 10.1117/12.696241
M3 - Conference contribution
AN - SCOPUS:34247338535
SN - 0819465011
SN - 9780819465016
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - 37th Annual Boulder Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
T2 - 37th Annual Boulder Damage Symposium - Laser-Induced Damage in Optical Materials: 2006
Y2 - 25 September 2006 through 27 September 2006
ER -