Details
| Original language | English |
|---|---|
| Pages (from-to) | 5613-5619 |
| Number of pages | 7 |
| Journal | Applied Optics |
| Volume | 35 |
| Issue number | 28 |
| Publication status | Published - 1 Oct 1996 |
| Externally published | Yes |
Abstract
Highly reflective LaF3/MgF2 systems for a wavelength of 248 nm on MgF2 and crystalline quartz substrates were investigated. The influence of laser conditioning on damage threshold and absorptance was remarkable in those coatings that had a high initial absorptance. Monitoring with a laser calorimeter revealed the conditioning effect to be a function of the irradiation dose rather than of energy density or pulse rate. Furthermore, x-ray photoelectron spectroscopy and transmission electron microscopy investigations showed that conditioning induces stoichiometric and structural changes in the multilayers, especially in near-surface sublayers, whereas scanning electron microscopy and atomic force microscopy investigations indicated that the surface remains unchanged.
Keywords
- Absorption, Conditioning, Excimer lasers, Fluoride coatings, Laser damage
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Atomic and Molecular Physics, and Optics
- Engineering(all)
- Engineering (miscellaneous)
- Engineering(all)
- Electrical and Electronic Engineering
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In: Applied Optics, Vol. 35, No. 28, 01.10.1996, p. 5613-5619.
Research output: Contribution to journal › Article › Research › peer review
}
TY - JOUR
T1 - Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm
AU - Eva, Eric
AU - Mann, Klaus
AU - Kaiser, Norbert
AU - Anton, B.
AU - Henking, Rainer
AU - Ristau, Detlev
AU - Weissbrodt, P.
AU - Mademann, D.
AU - Raupach, L.
AU - Hacker, Erich
PY - 1996/10/1
Y1 - 1996/10/1
N2 - Highly reflective LaF3/MgF2 systems for a wavelength of 248 nm on MgF2 and crystalline quartz substrates were investigated. The influence of laser conditioning on damage threshold and absorptance was remarkable in those coatings that had a high initial absorptance. Monitoring with a laser calorimeter revealed the conditioning effect to be a function of the irradiation dose rather than of energy density or pulse rate. Furthermore, x-ray photoelectron spectroscopy and transmission electron microscopy investigations showed that conditioning induces stoichiometric and structural changes in the multilayers, especially in near-surface sublayers, whereas scanning electron microscopy and atomic force microscopy investigations indicated that the surface remains unchanged.
AB - Highly reflective LaF3/MgF2 systems for a wavelength of 248 nm on MgF2 and crystalline quartz substrates were investigated. The influence of laser conditioning on damage threshold and absorptance was remarkable in those coatings that had a high initial absorptance. Monitoring with a laser calorimeter revealed the conditioning effect to be a function of the irradiation dose rather than of energy density or pulse rate. Furthermore, x-ray photoelectron spectroscopy and transmission electron microscopy investigations showed that conditioning induces stoichiometric and structural changes in the multilayers, especially in near-surface sublayers, whereas scanning electron microscopy and atomic force microscopy investigations indicated that the surface remains unchanged.
KW - Absorption
KW - Conditioning
KW - Excimer lasers
KW - Fluoride coatings
KW - Laser damage
UR - http://www.scopus.com/inward/record.url?scp=0000932497&partnerID=8YFLogxK
U2 - 10.1364/AO.35.005613
DO - 10.1364/AO.35.005613
M3 - Article
AN - SCOPUS:0000932497
VL - 35
SP - 5613
EP - 5619
JO - Applied Optics
JF - Applied Optics
SN - 1559-128X
IS - 28
ER -