Details
| Translated title of the contribution | Ion assisted deposition processes: In situ control |
|---|---|
| Original language | German |
| Pages (from-to) | 284-290 |
| Number of pages | 7 |
| Journal | Vakuum in Forschung und Praxis |
| Volume | 16 |
| Issue number | 6 |
| Publication status | Published - 2 Dec 2004 |
| Externally published | Yes |
Abstract
Ion assisted deposition processes for optical precision components exhibit a high potential, in particular in the near and mid infrared spectral region. The presented results demonstrate the important criterion of a minimized water adsorption in the thin film structures by measurements of the optical losses in the wavelength range around 3μm as well as by the determination of the spectral stability of the optics. Furthermore, the employment of an in situ monitor, which allows wide-band transmission measurements directly at the product, provides an extensive database for the process analysis and development. Thus, additional information about the growth behavior, the vacuum-to-air-shift, and about layer inhomogeneities is available. The combination of the in situ monitor with the coating plant control results in an automated process system, which allows a precise determination of the layer thickness and represents a basis for the rapid prototyping of complex layer systems. In contrast to standard monitor strategies, test coatings and calibration factors are not necessary. With the presented combination of the stable ion assisted deposition process and the in situ monitor, the production of demanding NIR/ MIR multilayer systems with high reproducibility could be automated.
ASJC Scopus subject areas
- Physics and Astronomy(all)
- Condensed Matter Physics
- Materials Science(all)
- Surfaces, Coatings and Films
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In: Vakuum in Forschung und Praxis, Vol. 16, No. 6, 02.12.2004, p. 284-290.
Research output: Contribution to journal › Review article › Research › peer review
}
TY - JOUR
T1 - Ionengestützte Beschichtungsprozesse in situ kontrollieren
AU - Ehlers, Henrik
AU - Groß, Tobias
AU - Lappschies, Marc
AU - Ristau, Detlev
PY - 2004/12/2
Y1 - 2004/12/2
N2 - Ion assisted deposition processes for optical precision components exhibit a high potential, in particular in the near and mid infrared spectral region. The presented results demonstrate the important criterion of a minimized water adsorption in the thin film structures by measurements of the optical losses in the wavelength range around 3μm as well as by the determination of the spectral stability of the optics. Furthermore, the employment of an in situ monitor, which allows wide-band transmission measurements directly at the product, provides an extensive database for the process analysis and development. Thus, additional information about the growth behavior, the vacuum-to-air-shift, and about layer inhomogeneities is available. The combination of the in situ monitor with the coating plant control results in an automated process system, which allows a precise determination of the layer thickness and represents a basis for the rapid prototyping of complex layer systems. In contrast to standard monitor strategies, test coatings and calibration factors are not necessary. With the presented combination of the stable ion assisted deposition process and the in situ monitor, the production of demanding NIR/ MIR multilayer systems with high reproducibility could be automated.
AB - Ion assisted deposition processes for optical precision components exhibit a high potential, in particular in the near and mid infrared spectral region. The presented results demonstrate the important criterion of a minimized water adsorption in the thin film structures by measurements of the optical losses in the wavelength range around 3μm as well as by the determination of the spectral stability of the optics. Furthermore, the employment of an in situ monitor, which allows wide-band transmission measurements directly at the product, provides an extensive database for the process analysis and development. Thus, additional information about the growth behavior, the vacuum-to-air-shift, and about layer inhomogeneities is available. The combination of the in situ monitor with the coating plant control results in an automated process system, which allows a precise determination of the layer thickness and represents a basis for the rapid prototyping of complex layer systems. In contrast to standard monitor strategies, test coatings and calibration factors are not necessary. With the presented combination of the stable ion assisted deposition process and the in situ monitor, the production of demanding NIR/ MIR multilayer systems with high reproducibility could be automated.
UR - http://www.scopus.com/inward/record.url?scp=12144285397&partnerID=8YFLogxK
U2 - 10.1002/vipr.200400236
DO - 10.1002/vipr.200400236
M3 - Übersichtsarbeit
AN - SCOPUS:12144285397
VL - 16
SP - 284
EP - 290
JO - Vakuum in Forschung und Praxis
JF - Vakuum in Forschung und Praxis
SN - 0947-076X
IS - 6
ER -